Nitrogen

Nitrogen

SCHEMBL4599415

CCCN(CCC)c1ccccc1.N#N

nearest known ligand 0.52

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 2/20 0.48
MEN1 O00255 1/20 0.44
HTT P42858 1/20 0.44
KMT2A Q03164 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
CNR2 P34972 2/20 0.44
TP53 P04637 2/20 0.42
NPSR1 Q6W5P4 1/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
TAAR1 Q96RJ0 1/20 0.41
RORC P51449 1/20 0.40
ESR1 P03372 1/20 0.40
ALDH1A1 P00352 1/20 0.39
GLA P06280 1/20 0.39
EGFR P00533 1/20 0.39
ERBB2 P04626 1/20 0.39
HTR7 P34969 1/20 0.38
CYP2C19 P33261 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL411733 0.95 TSHR (0.52) TSHRMEN1HTTKMT2ASMN1; SMN2
Hydrochloric Acid SCHEMBL2142184 0.93 TSHR (0.50) TSHRMEN1HTTKMT2ASMN1; SMN2
Water SCHEMBL31498994 0.93 TSHR (0.50) TSHRMEN1HTTKMT2ASMN1; SMN2
Diethylaniline SCHEMBL18092109 0.88 TSHR (0.57) TSHRMEN1KMT2ACNR2TP53
SCHEMBL19771743 0.86 TSHR (0.45) TSHRMEN1HTTKMT2ASMN1; SMN2
SCHEMBL1868440 0.86 CNR2 (0.47) TSHRMEN1KMT2ACNR2TP53
Nitrogen SCHEMBL29226366 0.86 CNR2 (0.47) TSHRMEN1KMT2ACNR2TP53
SCHEMBL2917098 0.86 TSHR (0.59) TSHRMEN1HTTKMT2ASMN1; SMN2
SCHEMBL20411975 0.85 NPC1 (0.47) TSHRCNR2TP53NPSR1HTR7
SCHEMBL11405777 0.85 TSHR (0.44) TSHRMEN1HTTKMT2ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1510246-B1 Method and apparatus for emulsification FUJIFILM CORP (JP) 2008-04-16 EP disclosed
US-20050272604-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2005-12-08 US disclosed
US-20050260518-A1 Heat sensitive recording material and microcapsule FUJI PHOTO FILM CO., LTD. 2005-11-24 US disclosed
EP-1598206-A2 Heat sensitive recording material and microcapsule FUJI PHOTO FILM CO., LTD. (JP) 2005-11-23 EP disclosed
EP-1598208-A2 Heat-sensitive recording material Fuji Photo Film Co., Ltd. (JP) 2005-11-23 EP disclosed
US-20050056170-A1 Method and apparatus for emulsification FUJI PHOTO FILM CO., LTD. 2005-03-17 US disclosed
EP-1510246-A2 Method and apparatus for emulsification Fuji Photo Film Co., Ltd. (JP) 2005-03-02 EP disclosed
US-6835692-B2 Heat-sensitive recording material containing oxonol dye FUJI PHOTO FILM CO., LTD. (JP) 2004-12-28 US disclosed
US-20040121909-A1 Heat-sensitive recording material containing oxonol dye FUJI PHOTO FILM CO., LTD. 2004-06-24 US disclosed
US-6667275-B2 Multilayer back coat in which the layer, which is most remote from the support, contains at least one of an inorganic lamellar compound, such as water swelling synthetic mica, and polyvinyl alcohol. FUJI PHOTO FILM CO., LTD. (JP) 2003-12-23 US disclosed
US-20020091065-A1 Heat-sensitive recording material FUJI PHOTO FILM CO., LTD. 2002-07-11 US disclosed
US-4540648-A LIGHT-SENSITIVE LAYER CONTAINING DIAZONIUM SALT, COUPLER, AND ACID STABILIZER HOECHST AKTIENGESELLSCHAFT (DE) 1985-09-10 US disclosed