⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL295044 | 0.79 | — | — | |
| SCHEMBL3074219 | 0.76 | — | — | |
| SCHEMBL380052 | 0.76 | — | — | |
| SCHEMBL12292221 | 0.73 | — | — | |
| SCHEMBL3082305 | 0.73 | — | — | |
| SCHEMBL3071361 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL3592433 | 0.72 | — | — | |
| SCHEMBL5170065 | 0.68 | — | — | |
| SCHEMBL3085165 | 0.67 | — | — | |
| Acetamidine SCHEMBL48895 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115710201-B | N- (1-iminoethyl) acetamidine nickel monohydrate, synthesis method and application thereof in super capacitor | 蚌埠学院 | 2025-01-03 | — | — | CN | claimed |
| CN-115710201-A | N- (1-iminoethyl) acetamidine nickel complex, synthetic method and application thereof in super capacitor | 蚌埠学院 | 2023-02-24 | — | — | CN | claimed |
| EP-1920081-A2 | ATOMIC LAYER DEPOSITION OF METAL-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS | E.I.Du pont de nemours and company (US) | 2008-05-14 | — | — | EP | claimed |
| EP-1913174-A1 | ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES | E.I.Du pont de nemours and company (US) | 2008-04-23 | — | — | EP | claimed |
| EP-1913173-A2 | ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES | E.I.Du pont de nemours and company (US) | 2008-04-23 | — | — | EP | claimed |
| WO-2007019437-A1 | ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | claimed |
| WO-2007019435-A2 | ATOMIC LAYER DEPOSITION OF METAL-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | claimed |
| WO-2007019436-A2 | ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | claimed |
| CN-115710201-B | N- (1-iminoethyl) acetamidine nickel monohydrate, synthesis method and application thereof in super capacitor | 蚌埠学院 | 2025-01-03 | — | — | CN | disclosed |
| CN-115710201-B | N- (1-iminoethyl) acetamidine nickel monohydrate, synthesis method and application thereof in super capacitor | 蚌埠学院 | 2025-01-03 | — | — | CN | disclosed |
| CN-115710201-A | N- (1-iminoethyl) acetamidine nickel complex, synthetic method and application thereof in super capacitor | 蚌埠学院 | 2023-02-24 | — | — | CN | disclosed |
| CN-115710201-A | N- (1-iminoethyl) acetamidine nickel complex, synthetic method and application thereof in super capacitor | 蚌埠学院 | 2023-02-24 | — | — | CN | disclosed |
| EP-1920081-A2 | ATOMIC LAYER DEPOSITION OF METAL-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS | E.I.Du pont de nemours and company (US) | 2008-05-14 | — | — | EP | disclosed |
| EP-1913174-A1 | ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES | E.I.Du pont de nemours and company (US) | 2008-04-23 | — | — | EP | disclosed |
| EP-1913173-A2 | ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES | E.I.Du pont de nemours and company (US) | 2008-04-23 | — | — | EP | disclosed |
| WO-2007019435-A2 | ATOMIC LAYER DEPOSITION OF METAL-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | disclosed |
| WO-2007019436-A2 | ATOMIC LAYER DEPOSITION OF TANTALUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND NOVEL TANTALUM COMPLEXES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | disclosed |
| WO-2007019437-A1 | ATOMIC LAYER DEPOSITION OF RUTHENIUM-CONTAINING FILMS USING SURFACE-ACTIVATING AGENTS AND SELECTED RUTHENIUM COMPLEXES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-02-15 | — | — | WO | disclosed |