Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.34 |
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.33 |
| ▸ | FFAR3 | O14843 | 1/20 | 0.33 |
| ▸ | LCK | P06239 | 1/20 | 0.33 |
| ▸ | FYN | P06241 | 1/20 | 0.33 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | CACNA1B | Q00975 | 1/20 | 0.31 |
| ▸ | APBA1 | Q02410 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL28108198 | 1.00 | TDP1 (0.35) | TDP1CA1CA2MEN1POLB | |
| Acetic Acid SCHEMBL131569 | 0.93 | FFAR3 (0.39) | TDP1CA1CA2MEN1POLB | |
| Acetic Acid SCHEMBL27627871 | 0.93 | FFAR3 (0.39) | TDP1CA1CA2MEN1POLB | |
| 1,3-Propanediol SCHEMBL7760174 | 0.91 | TSHR (0.36) | TDP1CA1CA2MEN1POLB | |
| Bicarbonate SCHEMBL10456880 | 0.90 | CA1 (0.37) | TDP1CA1CA2MEN1POLB | |
| Acetic Acid SCHEMBL667791 | 0.90 | TDP1 (0.37) | TDP1CA1CA2MEN1POLB | |
| Acetic Acid SCHEMBL8953871 | 0.90 | TDP1 (0.37) | TDP1CA1CA2MEN1POLB | |
| Thioglycolic Acid SCHEMBL27627424 | 0.90 | TDP1 (0.31) | TDP1CA1CA2TSHRCA9 | |
| Acetic Acid SCHEMBL4119712 | 0.86 | MEN1 (0.41) | TDP1CA1CA2MEN1POLB | |
| Propionic Acid SCHEMBL1903683 | 0.86 | FFAR3 (0.43) | TDP1CA1CA2MEN1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1554 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118344845-A | Surface treatment method and composition for use in the method | 富士胶片电子材料美国有限公司 | 2024-07-16 | — | — | CN | claimed |
| CN-117908329-A | KrF positive photoresist and preparation method thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| US-11920069-B2 | Compositions containing semiconducting nanoparticles, and polymer or composite layers formed therefrom, and optical devices | MERCK PATENT GMBH (DE) | 2024-03-05 | — | — | US | claimed |
| US-20230343582-A1 | SPIN ON CARBON COMPOSITION AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-10-26 | — | — | US | claimed |
| US-11772041-B2 | Composite amine absorbent, and device and method for removing CO2 or H2S, or both of CO2 and H2S | MITSUBISHI HEAVY INDUSTRIES, LTD. (JP) | 2023-10-03 | — | — | US | claimed |
| US-11746284-B2 | Composition comprising a semiconducting light emitting nanoparticle | MERCK PATENT GMBH (DE) | 2023-09-05 | — | — | US | claimed |
| CN-111752103-B | Red photosensitive resin composition and color filter comprising same | 东友精细化工有限公司 | 2023-08-25 | — | — | CN | claimed |
| US-11728161-B2 | Spin on carbon composition and method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-08-15 | — | — | US | claimed |
| CN-110799623-B | Composition comprising semiconductor luminescent nanoparticles | 默克专利股份有限公司 | 2023-06-27 | — | — | CN | claimed |
| EP-3635069-B1 | A COMPOSITION COMPRISING SEMICONDUCTING LIGHT-EMITTING NANOPARTICLES HAVING THIOL FUNCTIONAL SURFACE LIGANDS | MERCK PATENT GMBH (DE) | 2023-06-07 | — | — | EP | claimed |
| US-20090042127-A1 | PHOTORESIST COMPOSITION AND METHOD OF FORMING A PHOTORESIST PATTERN USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-02-12 | — | — | US | claimed |
| US-20080254634-A1 | Photoresist composition and method of manufacturing a thin-film transistor substrate using the same | SAMSUNG ELECTRONICS CO., LTD. | 2008-10-16 | — | — | US | claimed |
| US-20060281624-A1 | Mixed dispersants containing paste composition and display device including the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-12-14 | — | — | US | claimed |
| EP-0855620-B1 | Positive photoresist composition | JSR CORP (JP) | 2002-09-11 | — | — | EP | claimed |
| US-6319649-B1 | CAN FORM PATTERN WITH HIGH SENSITIVITY, RESOLUTION ABILITY AND STABILITY, ACCURACY | HITACHI, LTD. (JP) | 2001-11-20 | — | — | US | claimed |
| US-5942369-A | ALKALI-SOLUBLE NOVOLAK RESIN; ALKALI SOLUBLE ACRYLIC RESIN OF RADICAL-POLYMERIZABLE UNITS CONTAINING A: HYDROXYL GROUP, CARBOXYL GROUP, OR PHENOLIC HYDROXYL GROUP; QUINONEDIAZIDE AND SOLVENT; THICK FILMS AS BUMP FORMING MATERIALS | JSR CORPORATION (JP) | 1999-08-24 | — | — | US | claimed |
| EP-0923112-A1 | DETERGENT FOR LITHOGRAPHY | Clariant International Ltd. (CH) | 1999-06-16 | — | — | EP | claimed |
| EP-0855620-A1 | Positive photoresist composition | JSR Corporation (JP) | 1998-07-29 | — | — | EP | claimed |
| EP-0594452-B1 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-01-15 | — | — | EP | claimed |
| EP-0594452-A2 | Radiation sensitive resin composition for microlens | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-04-27 | — | — | EP | claimed |