SCHEMBL460862

SCHEMBL460862

[SiH3]c1ccccc1[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1666061 0.73
SCHEMBL3699651 0.73
SCHEMBL1651801 0.73
SCHEMBL467653 0.73
SCHEMBL67969 0.73
SCHEMBL3699799 0.73
SCHEMBL4306695 0.73
SCHEMBL13142318 0.71
Hydrochloric Acid SCHEMBL28959607 0.71 TSHR (0.53)
SCHEMBL3283924 0.71 NPC1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260117028-A1 CURABLE SILICONE COMPOSITION AND CURED PRODUCT THEREOF DOW SILICONES CORP (US) 2026-04-30 US claimed
US-20250263581-A1 ACTIVE ENERGY RAY CURABLE SILICONE COMPOSITION AND CURED PRODUCT THEREOF DOW SILICONES CORP (US) 2025-08-21 US claimed
CN-119095916-A Active energy ray curable silicone composition and cured product thereof 美国陶氏有机硅公司 2024-12-06 CN claimed
WO-2023211871-A1 ACTIVE ENERGY RAY CURABLE SILICONE COMPOSITION AND CURED PRODUCT THEREOF DOW SILICONES CORPORATION (US) 2023-11-02 WO claimed
WO-2023164018-A1 CURABLE SILICONE COMPOSITION AND CURED PRODUCT THEREOF DOW SILICONES CORPORATION (US) 2023-08-31 WO claimed
CN-111393648-A Environment-friendly self-repairing stretchable polysiloxane-based material and synthesis method and application thereof 中国海洋大学 2020-07-10 CN claimed
US-10316148-B2 Organopolysiloxane, production method thereof, and curable silicone composition DOW TORAY CO., LTD. (JP) 2019-06-11 US claimed
EP-3430100-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2019-01-23 EP claimed
US-20180079866-A1 ORGANOPOLYSILOXANE, PRODUCTION METHOD THEREOF, AND CURABLE SILICONE COMPOSITION DOW TORAY CO., LTD. (JP) 2018-03-22 US claimed
WO-2017160509-A1 POLYSILOXANE FORMULATIONS AND COATINGS FOR OPTOELECTRONIC APPLICATIONS, METHODS OF PRODUCTION, AND USES THEREOF HONEYWELL INTERNATIONAL INC. (US) 2017-09-21 WO claimed
US-20070026667-A1 Composition for forming etching stopper layer TASHIRO YUJI 2007-02-01 US claimed
EP-1677343-A1 COMPOSITION FOR FORMING ETCHING STOPPER LAYER AZ Electronic Materials USA Corp. (US) 2006-07-05 EP claimed
US-6936537-B2 Methods for forming low-k dielectric films THE BOC GROUP, INC. (US) 2005-08-30 US claimed
EP-1271634-A2 Methods for forming low-K dielectric films THE BOC GROUP, INC. (US) 2003-01-02 EP claimed
US-20020192980-A1 Methods for forming low-k dielectric films BOC GROUP, INC., THE 2002-12-19 US claimed
US-20020076944-A1 Organosilane CVD precursors and their use for making organosilane polymer low-k dielectric film BOC GROUP, INC., THE 2002-06-20 US claimed
US-5449800-A Silicon-containing pentacyclic compound, a silicon-containing ladder polymer, and methods for producing the same DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 1995-09-12 US claimed
EP-0055800-B1 A METHOD OF DEPOSITING A POLYMER FILM ON A SUBSTRATE International Business Machines Corporation (US) 1985-03-27 EP claimed
US-4397722-A Polymers from aromatic silanes and process for their preparation INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1983-08-09 US claimed
EP-0055800-A2 A method of depositing a polymer film on a substrate International Business Machines Corporation (US) 1982-07-14 EP claimed