⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29375564 | 0.45 | — | — | |
| SCHEMBL2909434 | 0.45 | — | — | |
| SCHEMBL722512 | 0.45 | — | — | |
| Hydrogen Sulfide SCHEMBL196034 | 0.45 | — | — | |
| SCHEMBL285122 | 0.45 | — | — | |
| SCHEMBL27281031 | 0.45 | — | — | |
| SCHEMBL8860314 | 0.45 | — | — | |
| SCHEMBL23794408 | 0.32 | — | — | |
| SCHEMBL124 | 0.32 | — | — | |
| Water SCHEMBL106633 | 0.32 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9682866-B2 | Neutral complex of cyclic silane, manufacturing method therefor, and method for manufacturing cyclic hydrogenated silane or cyclic organic silane | NIPPON SHOKUBAI CO., LTD. (JP) | 2017-06-20 | — | — | US | claimed |
| WO-2016205405-A1 | COORDINATION POLYMER | NDSU RESEARCH FOUNDATION (US) | 2016-12-22 | — | — | WO | claimed |
| US-20160311692-A1 | NEUTRAL COMPLEX OF CYCLIC SILANE, MANUFACTURING METHOD THEREFOR, AND METHOD FOR MANUFACTURING CYCLIC HYDROGENATED SILANE OR CYCLIC ORGANIC SILANE | NIPPON SHOKUBAI CO., LTD. (JP) | 2016-10-27 | — | — | US | claimed |
| US-20260002256-A1 | METHOD FOR PRODUCING SILICON FILM AND SILICON FILM | NIPPON SHOKUBAI CO., LTD. (JP) | 2026-01-01 | — | — | US | disclosed |
| WO-2024004998-A1 | METHOD FOR PRODUCING SILICON FILM, AND SILICON FILM | 株式会社日本触媒 | 2024-01-04 | — | — | WO | disclosed |
| US-20230357028-A1 | METHOD FOR PRODUCING HYDROGENATED POLYSILANE COMPOUND | NIPPON SHOKUBAI CO., LTD. (JP) | 2023-11-09 | — | — | US | disclosed |
| US-11495452-B2 | Method for producing silicon nitride film | TOHKU UNIVERSITY (JP) | 2022-11-08 | — | — | US | disclosed |
| CN-112638921-A | Method for the dehydrogenation of dichlorosilanes | 瓦克化学股份公司 | 2021-04-09 | — | — | CN | disclosed |
| US-20200335322-A1 | METHOD FOR PRODUCING SILICON NITRIDE FILM | TOHOKU UNIVERSITY (JP) | 2020-10-22 | — | — | US | disclosed |
| US-10676365-B2 | Hydrogenated silane composition | NIPPON SHOKUBAI CO., LTD. (JP) | 2020-06-09 | — | — | US | disclosed |
| US-10676366-B2 | Hydrogenated silane composition | NIPPON SHOKUBAI CO., LTD. (JP) | 2020-06-09 | — | — | US | disclosed |
| EP-1087428-B1 | Method for forming a silicon film and ink composition for inkjet printer | SEIKO EPSON CORP (JP) | 2008-05-21 | — | — | EP | disclosed |
| US-6527847-B1 | Coating composition | JSR CORPORATION (JP) | 2003-03-04 | — | — | US | disclosed |
| US-6517911-B1 | Process for the formation of silicon oxide films | JSR CORPORATION (JP) | 2003-02-11 | — | — | US | disclosed |
| US-6503570-B2 | Polysilanes | JRS CORPORATION (JP) | 2003-01-07 | — | — | US | disclosed |
| EP-1134224-A2 | Cyclosilane compound, and solution composition and process for forming a silicon film | JSR Corporation (JP) | 2001-09-19 | — | — | EP | disclosed |
| US-20010021760-A1 | Novel cyclosilane compound, and solution composition and process for forming a silicon film | JSR CORPORATION (JP) | 2001-09-13 | — | — | US | disclosed |
| EP-1092755-A1 | COATING COMPOSITION | JSR Corporation (JP) | 2001-04-18 | — | — | EP | disclosed |
| EP-1087433-A1 | PROCESS FOR THE FORMATION OF SILICON OXIDE FILMS | JSR Corporation (JP) | 2001-03-28 | — | — | EP | disclosed |
| EP-1087428-A1 | METHOD FOR FORMING A SILICON FILM AND INK COMPOSITION FOR INK JET | SEIKO EPSON CORPORATION (JP) | 2001-03-28 | — | — | EP | disclosed |