SCHEMBL4632308

SCHEMBL4632308

C[N-]C.C[N-]C.C[N-]C.C[Si](C)(C)[Ti+3]C1=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL4633130 0.91
Fluoride Ion SCHEMBL4634128 0.91
SCHEMBL222832 0.75
Hydrochloric Acid SCHEMBL8592397 0.71
Hydrochloric Acid SCHEMBL5610235 0.66
Hydrochloric Acid SCHEMBL12825632 0.64
Bromide SCHEMBL1539634 0.64
Hydrochloric Acid SCHEMBL1539626 0.64
Iodide SCHEMBL1539644 0.64
Fluoride Ion SCHEMBL1539670 0.64

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1520862-B1 Butadiene polymer, and process for producing conjugated diene polymer AGENCY IND SCIENCE TECHN (JP) 2008-05-28 EP disclosed
EP-1520862-A2 Butadiene polymer, and process for producing conjugated diene polymer JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2005-04-06 EP disclosed
EP-1054026-B1 BUTADIENE POLYMERS AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMERS JP AGENCY OF INDUSTRIALSCIENCE (JP) 2004-12-08 EP disclosed
US-6653430-B1 Addition polymerizing in presence of Group 4 metal complex having cyclopentadienyl structure and alumoxane cocatalyst; high cis configuration JAPAN AS REPRESENTED BY DIRECTOR GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2003-11-25 US disclosed
EP-1054026-A1 BUTADIENE POLYMERS AND PROCESS FOR PRODUCING CONJUGATED DIENE POLYMERS JAPAN as Represented by DIRECTOR GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2000-11-22 EP disclosed