SCHEMBL4632497

SCHEMBL4632497

CC=C(Cl)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4632495 1.00
SCHEMBL6718169 0.69
SCHEMBL1132476 0.69
SCHEMBL6395346 0.69
SCHEMBL6718188 0.69
SCHEMBL9761316 0.69
SCHEMBL190698 0.69
SCHEMBL10292310 0.69
SCHEMBL501535 0.69
SCHEMBL9480582 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104629359-A Mercapto-triazole gas pipeline drag reducer and preparation method thereof PETROCHINA CO LTD 2015-05-20 CN claimed
CN-116731320-A Production of dithiol compounds and their use in the production of liquid polysulfide polymers 诺力昂化学品国际有限公司 2023-09-12 CN disclosed
CN-105992796-A Poly-alpha-1, 3-1, 6-glucan for viscosity regulation 纳幕尔杜邦公司 2016-10-05 CN disclosed
CN-105916676-A Successively peelable coextruded polymer film with extended uv stability 3M创新有限公司 2016-08-31 CN disclosed
CN-104854135-A Preparation of poly alpha-1, 3-glucan ethers DU PONT 2015-08-19 CN disclosed
CN-104629359-A Mercapto-triazole gas pipeline drag reducer and preparation method thereof PETROCHINA CO LTD 2015-05-20 CN disclosed
EP-1927889-B1 Lithographic printing plate precursor FUJIFILM CORP (JP) 2014-06-25 EP disclosed
EP-1927889-A1 Lithographic printing plate precursor FUJIFILM Corporation (JP) 2008-06-04 EP disclosed
CN-100374478-C Thermally hardening, transparent coating substance, method for the production thereof and its use BASF COATINGS AG (DE) 2008-03-12 CN disclosed
CN-1978603-A Lubricant composition AFTON CHEMICAL CORP (US) 2007-06-13 CN disclosed
CN-1049238-C Copper-containing organometallic complexes and concontrates and diesel fuels containing same LUBRICOL CO (US) 2000-02-09 CN disclosed
EP-0939749-A1 PROCESS FOR THE PREPARATION OF BENZYL-ETHERS Agro-Chemie Növenyvedöszer Gyárto Ertékesito Es Forgalmazo KFT. (HU) 1999-09-08 EP disclosed
WO-1998022416-A1 PROCESS FOR THE PREPARATION OF BENZYL-ETHERS AGRO-CHEMIE NÖVÉNYVÉDÖSZER GYÁRTÓ ÉRTÉKESITÓ ÉS FORGALMAZÓ KFT. (HU) 1998-05-28 WO disclosed
US-5241017-A THIONYL PHOSPHAZENE POLYMERS BAYER AKTIENGESELLSCHAFT (DE) 1993-08-31 US disclosed
CN-1066677-A Cupric organometallic complex and the enriched material and the diesel oil fuel that contain this title complex LUBRIZOL CORP (US) 1992-12-02 CN disclosed
CN-1066675-A The low-sulfur diesel fuels that contains organometallic complex LUBRIZOL CORP (US) 1992-12-02 CN disclosed
EP-0504694-A2 Polythionyl phosphazenes, process for their preparation and use BAYER AG (DE) 1992-09-23 EP disclosed
US-4687727-A Light-sensitive planographic printing plate with layer of diazo resin containing photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1987-08-18 US disclosed
US-4511645-A ALLYL METHACRYLATE-METHACRYLIC ACID COPOLYMER, CURING AGENT, PHOTOINITIATOR FUJI PHOTO FILM CO., LTD. (JP) 1985-04-16 US disclosed
EP-0104863-A2 Light-sensitive planographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1984-04-04 EP disclosed