⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Butane SCHEMBL232861 | 0.93 | — | — | |
| Butane SCHEMBL5859491 | 0.93 | TSHR (0.44) | — | |
| Butane SCHEMBL22491 | 0.93 | — | — | |
| Butane SCHEMBL30942544 | 0.93 | — | — | |
| Butane SCHEMBL421381 | 0.93 | — | — | |
| Butane SCHEMBL10936122 | 0.86 | — | — | |
| Butane SCHEMBL136076 | 0.86 | — | — | |
| Butane SCHEMBL11217023 | 0.86 | — | — | |
| Butane SCHEMBL22408826 | 0.86 | — | — | |
| Butane SCHEMBL10684599 | 0.86 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080142046-A1 | Thermal F2 etch process for cleaning CVD chambers | AIR PRODUCTS AND CHEMICALS, INC. | 2008-06-19 | — | — | US | claimed |
| EP-1932941-A1 | Thermal etch process for cleaning CVD chambers | Air Products and Chemicals, Inc. (US) | 2008-06-18 | — | — | EP | claimed |
| CN-104752504-B | Semiconductor device structure and its manufacturing method | 台湾积体电路制造股份有限公司 | 2018-05-25 | — | — | CN | disclosed |
| US-20080142046-A1 | Thermal F2 etch process for cleaning CVD chambers | AIR PRODUCTS AND CHEMICALS, INC. | 2008-06-19 | — | — | US | disclosed |
| EP-1932941-A1 | Thermal etch process for cleaning CVD chambers | Air Products and Chemicals, Inc. (US) | 2008-06-18 | — | — | EP | disclosed |