SCHEMBL4636780

SCHEMBL4636780

CCCCCCCCCCOCCOC(C)O

nearest known ligand 0.57

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HTT P42858 2/20 0.57
MEN1 O00255 1/20 0.57
THRB P10828 1/20 0.57
KMT2A Q03164 1/20 0.57
MAPT P10636 1/20 0.57
USP2 O75604 1/20 0.50
SPHK1 Q9NYA1 1/20 0.49
CES2 O00748 2/20 0.44
LPAR5 Q9H1C0 3/20 0.42
TSHR P16473 1/20 0.41
LPAR1 Q92633 6/20 0.41
LPAR3 Q9UBY5 6/20 0.41
LPAR2 Q9HBW0 3/20 0.41
CES1 P23141 1/20 0.40
DNM1 Q05193 1/20 0.39
LPAR6 P43657 2/20 0.39
LPAR4 Q99677 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5460271 1.00 HTT (0.57) HTTMEN1THRBKMT2AMAPT
SCHEMBL28383720 1.00 HTT (0.57) HTTMEN1THRBKMT2AMAPT
SCHEMBL28659327 1.00 HTT (0.57) HTTMEN1THRBKMT2AMAPT
SCHEMBL31066788 1.00 HTT (0.57) HTTMEN1THRBKMT2AMAPT
SCHEMBL6283240 1.00 HTT (0.57) HTTMEN1THRBKMT2AMAPT
SCHEMBL29377792 0.98 HTT (0.54) HTTMEN1THRBKMT2AMAPT
SCHEMBL30544387 0.94 HTT (0.54) HTTMEN1THRBKMT2AMAPT
SCHEMBL1308908 0.91 TSHR (0.50) HTTMEN1THRBKMT2AMAPT
SCHEMBL4799586 0.91 TSHR (0.50) HTTMEN1THRBKMT2AMAPT
Phosphoric Acid SCHEMBL28380159 0.91 LPAR5 (0.51) HTTMEN1THRBKMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107428665-B Method for producing (meth) acrylic ester 东亚合成株式会社 2021-10-15 CN disclosed
CN-107406363-B Method for producing (meth) acrylic ester 东亚合成株式会社 2021-10-08 CN disclosed
EP-1794199-A4 PHOTOCURABLE RESIN COMPOSITION HITACHI CHEMICAL CO LTD (JP) 2008-02-20 EP disclosed
EP-1794199-A1 PHOTOCURABLE RESIN COMPOSITION Hitachi Chemical Co., Ltd. (JP) 2007-06-13 EP disclosed
WO-2006035683-A1 PHOTOCURABLE RESIN COMPOSITION HITACHI CHEMICAL CO., LTD. (JP) 2006-04-06 WO disclosed