Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL176168 | 0.86 | MEN1 (0.48) | TSHRMAPK1MEN1KMT2A | |
| SCHEMBL14269358 | 0.86 | MEN1 (0.48) | TSHRMAPK1MEN1KMT2A | |
| SCHEMBL4459210 | 0.86 | MEN1 (0.48) | TSHRMAPK1MEN1KMT2A | |
| SCHEMBL13908145 | 0.86 | CYP4F2 (0.31) | — | |
| SCHEMBL1890299 | 0.78 | — | — | |
| SCHEMBL28584959 | 0.77 | TSHR (0.30) | TSHRMAPK1 | |
| SCHEMBL7949071 | 0.75 | — | — | |
| SCHEMBL14524703 | 0.75 | CYP19A1 (0.32) | — | |
| SCHEMBL14778541 | 0.74 | MEN1 (0.30) | TSHRMEN1KMT2A | |
| SCHEMBL14777772 | 0.74 | MEN1 (0.30) | TSHRMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2621994-A1 | EPOXY RESIN COMPOSITIONS | Dow Global Technologies LLC (US) | 2013-08-07 | — | — | EP | claimed |
| EP-2621990-A2 | THERMOSETTABLE COMPOSITIONS AND THERMOSETS THEREFROM | Dow Global Technologies LLC (US) | 2013-08-07 | — | — | EP | claimed |
| WO-2012047420-A2 | THERMOSETTABLE COMPOSITIONS AND THERMOSETS THEREFROM | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-04-12 | — | — | WO | claimed |
| WO-2012044443-A1 | EPOXY RESIN COMPOSITIONS | DOW GLOBAL TECHNOLOGIES LLC (US) | 2012-04-05 | — | — | WO | claimed |
| WO-2005065957-A1 | INKJET RECORDING ELEMENT COMPRISING POLYESTER IONOMER | EASTMAN KODAK COMPANY (US) | 2005-07-21 | — | — | WO | claimed |
| US-4863835-A | UNSATURATED POLYESTER, BENZYL ALCOHOL, TETRAHYDROFURFURYL ALCOHOL, ACID | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1989-09-05 | — | — | US | claimed |
| WO-2024116133-A1 | BINDER COMPOSITIONS AND USE THEREOF | NILO LIMITED (NZ) | 2024-06-06 | — | — | WO | disclosed |
| WO-2023200684-A1 | COMPOSITION, URETHANE PREPOLYMER, AND RELATED METHODS AND USES | DOW SILICONES CORPORATION (US) | 2023-10-19 | — | — | WO | disclosed |
| EP-4211003-A1 | ISOCYANATE-FUNCTIONAL PREPOLYMER, COMPOSITION COMPRISING SAME, AND COATING FORMED THEREWITH | Dow Silicones Corporation (US) | 2023-07-19 | — | — | EP | disclosed |
| EP-2935186-A1 | POLYTHIOLS AS CIS/TRANS ISOMERIZATION CATALYSTS FOR UNSATURATED COMPOUNDS | DSM IP Assets B.V. (NL) | 2015-10-28 | — | — | EP | disclosed |
| WO-2014097171-A1 | POLYTHIOLS AS CIS/TRANS ISOMERIZATION CATALYSTS FOR UNSATURATED COMPOUNDS | DSM IP ASSETS B.V. (NL) | 2014-06-26 | — | — | WO | disclosed |
| WO-2013129704-A1 | MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2013-09-06 | — | — | WO | disclosed |
| WO-2013113642-A1 | REPAIR PROCESS AND PRIMER COMPOSITION | AKZO NOBEL COATINGS INTERNATIONAL B.V. (NL) | 2013-08-08 | — | — | WO | disclosed |
| WO-2000031196-A1 | CURABLE COMPOSITIONS COMPRISING ACETOACETOXY AND IMINE FUNCTIONALITY | THE SHERWIN-WILLIAMS COMPANY (US) | 2000-06-02 | — | — | WO | disclosed |
| US-5424164-A | Image forming method | FUJI PHOTO FILM CO., LTD (JP) | 1995-06-13 | — | — | US | disclosed |
| WO-1992022858-A1 | REDUCED VISCOSITY POLYESTER COMPOSITION FOR TONER POWDERS | EASTMAN KODAK COMPANY (US) | 1992-12-23 | — | — | WO | disclosed |
| EP-0316873-A2 | Reactive coatings comprising an acid-functional compound, an anhydride-functional compound, an epoxy-functional compound and a hydroxy-functional compound | THE SHERWIN-WILLIAMS COMPANY (US) | 1989-05-24 | — | — | EP | disclosed |
| EP-0037179-B1 | DEVELOPER COMPOSITION FOR LITHOGRAPHIC PRINTING PLATES, A METHOD OF PLATE DEVELOPMENT, AND DEVELOPED PLATES | MITSUBISHI KASEI CORPORATION (JP) | 1985-05-29 | — | — | EP | disclosed |
| US-4271261-A | PHOTOSENSITIVE POLYMER | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1981-06-02 | — | — | US | disclosed |
| US-4101326-A | Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters | EASTMAN KODAK COMPANY (US) | 1978-07-18 | — | — | US | disclosed |