SCHEMBL4644863

SCHEMBL4644863

C1CC(C2CS2)SC(C2CS2)C1

nearest known ligand 0.46

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4647270 0.86 MAPK1 (0.36) MAPK1
SCHEMBL3838064 0.86
SCHEMBL7232312 0.78 MAPK1 (0.56) MAPK1
SCHEMBL15907943 0.78 MAPK1 (0.56) MAPK1
SCHEMBL3075445 0.78
SCHEMBL862038 0.78
SCHEMBL7224887 0.78
SCHEMBL18643579 0.78
SCHEMBL12931381 0.75
SCHEMBL16877532 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed