⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7053730 | 1.00 | — | — | |
| SCHEMBL14473660 | 0.86 | CYP3A4 (0.31) | — | |
| SCHEMBL5672300 | 0.82 | MEN1 (0.31) | — | |
| SCHEMBL13537778 | 0.76 | — | — | |
| SCHEMBL4651593 | 0.76 | — | — | |
| SCHEMBL19363012 | 0.74 | — | — | |
| SCHEMBL7906063 | 0.74 | — | — | |
| SCHEMBL818248 | 0.74 | — | — | |
| SCHEMBL7908838 | 0.74 | — | — | |
| SCHEMBL19118462 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116789887-A | Ionic photoacid generator film-forming resin copolymer, preparation method and application | 中国科学院福建物质结构研究所 | 2023-09-22 | — | — | CN | claimed |
| CN-116789887-A | Ionic photoacid generator film-forming resin copolymer, preparation method and application | 中国科学院福建物质结构研究所 | 2023-09-22 | — | — | CN | disclosed |
| US-7862980-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-04 | — | — | US | disclosed |
| US-7862980-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-04 | — | — | US | disclosed |
| US-20090263611-A1 | OPTICAL RECORDING MEDIUM, OPTICAL RECORDING MATERIAL AND METAL COMPLEX COMPOUND | MITSUBISHI KAGAKU MEDIA CO., LTD. (JP) | 2009-10-22 | — | — | US | disclosed |
| US-7579497-B2 | Sulfonium or iodonium salt of aryl(methyl) sulfoacetate in which the alpha carbon is fluoro- or perfluoroalkyl-substituted: triphenylsulfonium (1-(5-hydroxynaphthyl)oxyethoxycarbonyl) difluoromethanesulfonate; acid labile resin; 2-Ethyl-2-adamantyl methacrylate copolymer; improve line edge roughness | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-25 | — | — | US | disclosed |
| US-7579497-B2 | Sulfonium or iodonium salt of aryl(methyl) sulfoacetate in which the alpha carbon is fluoro- or perfluoroalkyl-substituted: triphenylsulfonium (1-(5-hydroxynaphthyl)oxyethoxycarbonyl) difluoromethanesulfonate; acid labile resin; 2-Ethyl-2-adamantyl methacrylate copolymer; improve line edge roughness | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-08-25 | — | — | US | disclosed |
| EP-1473291-B1 | PROCESS FOR PRODUCING LACTONE | MITSUBISHI RAYON CO (JP) | 2008-08-13 | — | — | EP | disclosed |
| WO-2008087549-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-07-24 | — | — | WO | disclosed |
| US-20080171270-A1 | Polymers Useful in Photoresist Compositions and Compositions Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2008-07-17 | — | — | US | disclosed |
| US-20080171270-A1 | Polymers Useful in Photoresist Compositions and Compositions Thereof | AZ ELECTRONIC MATERIALS USA CORP. | 2008-07-17 | — | — | US | disclosed |
| WO-2008080988-A2 | CYCLOPENTANONE DERIVATIVES, METHOD OF SYNTHESIS AND USES THEREOF | NEUROPHARMA, S.A. (ES) | 2008-07-10 | — | — | WO | disclosed |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080081293-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20070078269-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
| US-20070078269-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |