Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2C | P28335 | 4/20 | 0.33 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.32 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.32 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.32 |
| ▸ | KMO | O15229 | 1/20 | 0.31 |
| ▸ | KDM1A | O60341 | 2/20 | 0.31 |
| ▸ | SLC18A3 | Q16572 | 1/20 | 0.31 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28529394 | 0.80 | — | — | |
| SCHEMBL383636 | 0.80 | — | — | |
| SCHEMBL27871634 | 0.78 | TSHR (0.40) | HTR2CKDM1ASLC18A3SIGMAR1 | |
| SCHEMBL11495069 | 0.72 | TSHR (0.36) | HTR2CKDM1AMAPT | |
| SCHEMBL14675631 | 0.70 | — | — | |
| SCHEMBL6935362 | 0.67 | HTR2C (0.52) | HTR2CHDAC4HDAC2HDAC8KMO | |
| SCHEMBL19036408 | 0.67 | KDM1A (0.48) | KDM1A | |
| SCHEMBL5181880 | 0.66 | SLC18A3 (0.42) | SLC18A3SIGMAR1GAA | |
| SCHEMBL5112225 | 0.65 | IDO1 (0.33) | — | |
| SCHEMBL28379460 | 0.65 | ESR2 (0.43) | KDM1AGAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6201061-B1 | CURING A RESIN FOR OPTICAL USE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-03-13 | — | — | US | claimed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| EP-1120667-B1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-06-22 | — | — | EP | disclosed |
| EP-1099721-B1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL CO (JP) | 2005-01-12 | — | — | EP | disclosed |
| US-6472495-B1 | RESIN PRODUCED BY CURING THE COMPOSITION BY POLYMERIZATION HAS AN EXCELLENT IMPACT RESISTANCE AND OPTICAL PROPERTIES, AND IS SUITABLE AS AN OPTICAL MATERIAL. POLYMERS WITH SULFIDE, SELINIUM AND TELLURIUM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2002-10-29 | — | — | US | disclosed |
| US-6444146-B2 | DISCOLORATION INHIBITION | MITSUBISHI GAS CHEMICAL CO. (JP) | 2002-09-03 | — | — | US | disclosed |
| EP-1120667-A2 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-08-01 | — | — | EP | disclosed |
| US-20010008278-A1 | Process for production of optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC (JP) | 2001-07-19 | — | — | US | disclosed |
| EP-1099721-A1 | Composition for producing resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-05-16 | — | — | EP | disclosed |