⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4998493 | 0.97 | — | — | |
| SCHEMBL27944677 | 0.80 | — | — | |
| SCHEMBL4859362 | 0.79 | — | — | |
| SCHEMBL4862335 | 0.77 | — | — | |
| SCHEMBL12090416 | 0.76 | — | — | |
| SCHEMBL6856765 | 0.71 | — | — | |
| SCHEMBL7182004 | 0.70 | — | — | |
| SCHEMBL6861212 | 0.68 | — | — | |
| SCHEMBL17352904 | 0.67 | — | — | |
| SCHEMBL4647952 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |
| CN-1328600-C | Composition for optical material | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-07-25 | — | — | CN | disclosed |
| CN-1471645-A | Composition for optical material | 三菱瓦斯化学株式会社 | 2004-01-28 | — | — | CN | disclosed |