SCHEMBL4647767

SCHEMBL4647767

C1CC(SC2CCC(CSCC3CS3)CC2)CCC1CSCC1CS1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1402540 0.89
SCHEMBL12090408 0.87
SCHEMBL4989810 0.80
SCHEMBL4860533 0.79
SCHEMBL7874128 0.78 TBXA2R (0.33)
SCHEMBL12090656 0.78
SCHEMBL4646028 0.77
SCHEMBL172244 0.76
SCHEMBL4861239 0.76
SCHEMBL4649030 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116554434-A Diisocyanate composition for optical lenses and method for preparing the same SKC株式会社 2023-08-08 CN disclosed
CN-112920082-B Diisocyanate composition, method for preparing the same, and optical material using the same SKC株式会社 2023-06-23 CN disclosed
CN-112920374-B Diisocyanate composition for optical lenses and method for preparing the same SKC株式会社 2023-05-30 CN disclosed
CN-112920371-B Process for preparing diisocyanate compositions SKC株式会社 2023-05-12 CN disclosed
CN-112920372-B Method for preparing diisocyanate composition and optical lens SKC株式会社 2023-05-12 CN disclosed
CN-112920375-B Method for preparing diisocyanate composition and optical lens SKC株式会社 2023-05-12 CN disclosed
CN-112920370-B Method for preparing diisocyanate composition and optical lens SKC株式会社 2023-05-12 CN disclosed
CN-112920373-B Diisocyanate composition, method for preparing the same, and optical material using the same SKC株式会社 2023-05-12 CN disclosed
US-20080206668-A1 NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
EP-1962139-A1 Negative resist composition and pattern forming method using the same FUJIFILM Corporation (JP) 2008-08-27 EP disclosed