⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20726033 | 0.81 | CYP1A2 (0.33) | — | |
| SCHEMBL16521909 | 0.81 | CYP1A2 (0.33) | — | |
| SCHEMBL15659655 | 0.79 | — | — | |
| SCHEMBL2686433 | 0.74 | — | — | |
| SCHEMBL18729637 | 0.74 | — | — | |
| SCHEMBL18729634 | 0.74 | — | — | |
| SCHEMBL13896933 | 0.71 | — | — | |
| SCHEMBL7225564 | 0.70 | — | — | |
| SCHEMBL15732336 | 0.70 | — | — | |
| SCHEMBL8596579 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115135697-A | Process for producing polythioether compound | 株式会社大赛璐 | 2022-09-30 | — | — | CN | disclosed |
| CN-113278149-A | Process for producing polythioether compound | 株式会社大赛璐 | 2021-08-20 | — | — | CN | disclosed |
| US-20120296024-A1 | ORGANOSILICON COMPOUND AND ITS PRODUCTION METHOD, COMPOUNDING AGENT FOR RUBBER, RUBBER COMPOSITION, AND TIRE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-11-22 | — | — | US | disclosed |
| EP-2524923-A1 | Organosilicon compound and its production method, compounding agent for rubber, rubber composition, and tire | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20080206668-A1 | NEGATIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-08-28 | — | — | US | disclosed |
| EP-1962139-A1 | Negative resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2008-08-27 | — | — | EP | disclosed |