SCHEMBL464893

SCHEMBL464893

CC1CC2OC2CC1C1CC2OC2CC1C

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
PPP5C P53041 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12292920 0.84
SCHEMBL21300119 0.83
SCHEMBL4459831 0.83
SCHEMBL19928637 0.82
SCHEMBL10335733 0.78
SCHEMBL22839929 0.78
SCHEMBL11785032 0.78 PPP5C (0.34) PPP5C
SCHEMBL15147153 0.76
SCHEMBL15692483 0.76
SCHEMBL16904974 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2842980-B1 LOW-VISCOSITY LIQUID RADIATION CURABLE DENTAL ALIGNER MOLD RESIN COMPOSITIONS FOR ADDITIVE MANUFACTURING DSM IP ASSETS BV (NL) 2021-05-05 EP claimed
EP-2941781-B1 PHOTOSENSITIVE GAS GENERATING AGENT AND PHOTOCURABLE COMPOSITION CANON KK (JP) 2017-08-09 EP disclosed
EP-2223969-B1 RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME MITSUI CHEMICALS INC (JP) 2015-02-25 EP disclosed
US-20140363773-A1 PATTERN-FORMING METHOD JSR CORPORATION (JP) 2014-12-11 US disclosed
US-8853290-B2 Photosensitive composition SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2014-10-07 US disclosed
US-8648130-B2 Resin composition, transparent member obtained from the resin composition, and use of the same MITSUI CHEMICALS, INC. (JP) 2014-02-11 US disclosed
US-8211624-B2 Method for pattern formation and resin composition for use in the method JSR CORPORATION (JP) 2012-07-03 US disclosed
US-20120156621-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2012-06-21 US disclosed
US-20120142806-A1 PHOTOSENSITIVE COMPOSITION SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2012-06-07 US disclosed
EP-2441778-A1 PHOTOSENSITIVE COMPOSITION Sanyo Chemical Industries, Ltd. (JP) 2012-04-18 EP disclosed
EP-1646493-B1 VISCOSITY REDUCIBLE RADIATION CURABLE RESIN COMPOSITION DSM IP ASSETS BV (NL) 2011-11-16 EP disclosed
EP-2372405-A1 Lens and method for producing lens Canon Kabushiki Kaisha (JP) 2011-10-05 EP disclosed
US-20100256271-A1 RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME MITSUI CHEMICALS, INC. (JP) 2010-10-07 US disclosed
EP-2223969-A1 RESIN COMPOSITION, TRANSPARENT MEMBER OBTAINED FROM THE RESIN COMPOSITION, AND USE OF THE SAME Mitsui Chemicals, Inc. (JP) 2010-09-01 EP disclosed
US-20100190104-A1 METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD JSR CORPORATION (JP) 2010-07-29 US disclosed
EP-1955849-B1 Ink-jet recording method and ink-jet recording apparatus FUJIFILM CORP (JP) 2010-06-23 EP disclosed
EP-1955849-A2 Ink-jet recording method and ink-jet recording apparatus FUJIFILM Corporation (JP) 2008-08-13 EP disclosed
EP-1930749-A1 OPTICAL FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE JSR Corporation (JP) 2008-06-11 EP disclosed
EP-1785753-A1 OPTICAL FILM, POLARIZATION PLATE AND LIQUID CRYSTAL DISPLAY JSR Corporation (JP) 2007-05-16 EP disclosed