⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6570542 | 0.83 | — | — | |
| SCHEMBL8413461 | 0.77 | — | — | |
| SCHEMBL4945634 | 0.74 | — | — | |
| SCHEMBL8416767 | 0.74 | — | — | |
| SCHEMBL5080045 | 0.61 | — | — | |
| SCHEMBL8196098 | 0.61 | — | — | |
| SCHEMBL3798051 | 0.61 | — | — | |
| SCHEMBL7595068 | 0.61 | — | — | |
| SCHEMBL27347350 | 0.61 | — | — | |
| SCHEMBL28189624 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | claimed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | claimed |
| EP-2937733-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS | IBF - Indústria Brasileira de Filmes S/A (BR) | 2015-10-28 | — | — | EP | claimed |
| US-10254646-B2 | Composition sensitive to radiation in electromagnetic spectrum ranges for printing purposes, printing plate comprising said composition, use of said composition and image development process | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2019-04-09 | — | — | US | disclosed |
| US-20160026080-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVLOPMENT PROCESS | IBF INDUSTRIA BRASILEIRA DE FILMES S/A (BR) | 2016-01-28 | — | — | US | disclosed |
| EP-2937733-A1 | COMPOSITION SENSITIVE TO RADIATION IN ELECTROMAGNETIC SPECTRUM RANGES FOR PRINTING PURPOSES, PRINTING PLATE COMPRISING SAID COMPOSITION, USE OF SAID COMPOSITION AND IMAGE DEVELOPMENT PROCESS | IBF - Indústria Brasileira de Filmes S/A (BR) | 2015-10-28 | — | — | EP | disclosed |
| EP-1958782-B1 | Ink-jet recording method and apparatus | FUJIFILM CORP (JP) | 2014-08-27 | — | — | EP | disclosed |
| US-20080199631-A1 | Mixture of polymer and oligomer; curing ; recording images by discharging ink curable by radiation | FUJIFILM CORPORATION (JP) | 2008-08-21 | — | — | US | disclosed |
| EP-1958782-A1 | Undercoat liquid, in jet recording method and ink jet recording apparatus | Fujifilm Corporation (JP) | 2008-08-20 | — | — | EP | disclosed |
| EP-1502735-B1 | Polymerizable composition | FUJIFILM CORP (JP) | 2008-04-02 | — | — | EP | disclosed |
| EP-0860741-B1 | Photopolymerizable composition | FUJI PHOTO FILM CO LTD (JP) | 2001-05-16 | — | — | EP | disclosed |
| US-6051367-A | COMPRISING ONE OR MORE ADDITION-POLYMERIZABLE ETHYLENICALLY UNSATURATED COMPOUNDS AND A SPECIFIC OXIME ETHER COMPOUND; HIGH SENSITIVE TO ACTINIC RAYS RANGING FROM ULTRAVIOLET TO VISIBLE LIGHT, IMPROVED FILM STRENGTH | FUJI PHOTO FILM CO., LTD. (JP) | 2000-04-18 | — | — | US | disclosed |
| EP-0860741-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-08-26 | — | — | EP | disclosed |