⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28347499 | 0.96 | — | — | |
| SCHEMBL28098317 | 0.92 | — | — | |
| SCHEMBL3176396 | 0.84 | — | — | |
| SCHEMBL3092393 | 0.84 | — | — | |
| SCHEMBL27563656 | 0.84 | TSHR (0.61) | — | |
| Iodide SCHEMBL29064213 | 0.81 | TSHR (0.57) | — | |
| Iodide SCHEMBL29064549 | 0.81 | TSHR (0.57) | — | |
| SCHEMBL6913593 | 0.75 | — | — | |
| SCHEMBL28351304 | 0.70 | — | — | |
| Pentane SCHEMBL9633320 | 0.68 | TSHR (1.00) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12474638-B2 | Underlayer for photoresist adhesion and dose reduction | LAM RESEARCH CORPORATION (US) | 2025-11-18 | — | — | US | disclosed |
| US-20240255850-A1 | UNDERLAYER FOR PHOTORESIST ADHESION AND DOSE REDUCTION | LAM RES CORP (US) | 2024-08-01 | — | — | US | disclosed |
| WO-2023215136-A1 | POST-DEVELOPMENT TREATMENT OF METAL-CONTAINING PHOTORESIST | LAM RESEARCH CORPORATION (US) | 2023-11-09 | — | — | WO | disclosed |
| CN-116705595-A | Underlayer for photoresist adhesion and dose reduction | 朗姆研究公司 | 2023-09-05 | — | — | CN | disclosed |
| US-20230259025-A1 | DRY DEPOSITED PHOTORESISTS WITH ORGANIC CO-REACTANTS | LAM RESEARCH CORPORATION | 2023-08-17 | — | — | US | disclosed |
| WO-2023115023-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| WO-2023114724-A1 | DEVELOPMENT OF HYBRID ORGANOTIN OXIDE PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | disclosed |
| CN-116171403-A | Photoresist from Sn (II) precursor | 朗姆研究公司 | 2023-05-26 | — | — | CN | disclosed |
| CN-113574456-B | Underlayer for photoresist adhesion and dose reduction | 朗姆研究公司 | 2023-05-26 | — | — | CN | disclosed |
| CN-116134383-A | Metal chelators for development of metal-containing photoresists | 朗姆研究公司 | 2023-05-16 | — | — | CN | disclosed |
| EP-1541592-A1 | PROCESS FOR PRODUCTION OF LIVING RADICAL POLYMERS AND POLYMERS | OTSUKA CHEMICAL COMPANY, LIMITED (JP) | 2005-06-15 | — | — | EP | disclosed |
| EP-1131273-A1 | 1,4-DIARYL-2-FLUORO-1-BUTEN-3-OL COMPOUNDS AND THEIR USE IN THE PREPARATION OF 1,4-DIARYL-2-FLUORO-1,3-BUTADIENE AND 1,4-DIARYL-2-FLUORO-2-BUTENE COMPOUNDS | AMERICAN CYANAMID COMPANY (US) | 2001-09-12 | — | — | EP | disclosed |
| WO-2000029362-A1 | 1,4-DIARYL-2-FLUORO-1-BUTEN-3-OL COMPOUNDS AND THEIR USE IN THE PREPARATION OF 1,4-DIARYL-2-FLUORO-1,3-BUTADIENE AND 1,4-DIARYL-2-FLUORO-2-BUTENE COMPOUNDS | AMERICAN CYANAMID COMPANY (US) | 2000-05-25 | — | — | WO | disclosed |
| EP-0954558-A1 | FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY | ORR, William C. (US) | 1999-11-10 | — | — | EP | disclosed |
| WO-1998026028-A1 | FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY | ORR WILLIAM C (US) | 1998-06-18 | — | — | WO | disclosed |
| EP-0478590-B1 | METHOD FOR PREPARATION OF ORGANO-TELLURIUM AND SELENIUM COMPOUNDS | SECR DEFENCE BRIT (GB) | 1994-07-27 | — | — | EP | disclosed |
| US-5166428-A | Method for preparation of organo-tellurium and selenium compounds | THE SECRETARY OF STATE FOR DEFENCE IN HER BRITANNIC MAJESTY'S GOVERNMENT OF THE UNITED KINGDOM OF GREAT BRITAIN AND NORTHERN IRELAND (GB) | 1992-11-24 | — | — | US | disclosed |
| EP-0478590-A1 | METHOD FOR PREPARATION OF ORGANO-TELLURIUM AND SELENIUM COMPOUNDS. | SECR DEFENCE BRIT (GB) | 1992-04-08 | — | — | EP | disclosed |
| WO-1990015796-A1 | METHOD FOR PREPARATION OF ORGANO-TELLURIUM AND SELENIUM COMPOUNDS | THE SECRETARY OF STATE FOR DEFENCE IN HER BRITANNIC MAJESTY'S GOVERNMENT OF THE UNITED KINGDOM OF GREAT BRITAIN AND NORTHERN IRELAND (GB) | 1990-12-27 | — | — | WO | disclosed |
| EP-0285834-A1 | Allyltellurides and their use in the MOCVD growth of group II-VI epitaxial films | AMERICAN CYANAMID COMPANY (US) | 1988-10-12 | — | — | EP | disclosed |