⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1302441 | 0.85 | PPP5C (0.30) | — | |
| SCHEMBL31193315 | 0.82 | PPM1B (0.32) | — | |
| SCHEMBL28549761 | 0.80 | — | — | |
| SCHEMBL8997401 | 0.73 | — | — | |
| SCHEMBL11655327 | 0.73 | CYP4F2 (0.31) | — | |
| SCHEMBL11723429 | 0.72 | — | — | |
| SCHEMBL27899398 | 0.72 | — | — | |
| SCHEMBL1010976 | 0.72 | — | — | |
| SCHEMBL28126083 | 0.71 | CYP4F2 (0.44) | — | |
| SCHEMBL187543 | 0.69 | PPP5C (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113956441-B | Molded free radical modified epoxy resin composition | 上纬新材料科技股份有限公司 | 2023-12-26 | — | — | CN | disclosed |
| CN-113150496-B | Epoxy resin reinforced material | 上纬新材料科技股份有限公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-113150221-B | Unsaturated polyester and free radical modified epoxy resin composition | 上纬新材料科技股份有限公司 | 2023-05-16 | — | — | CN | disclosed |
| EP-2406318-A2 | RADIATION CURABLE RESIN COMPOSITION AND RAPID THREE-DIMENSIONAL IMAGING PROCESS USING THE SAME | DSM IP Assets B.V. (NL) | 2012-01-18 | — | — | EP | disclosed |
| WO-2010104603-A2 | RADIATION CURABLE RESIN COMPOSITION AND RAPID THREE-DIMENSIONAL IMAGING PROCESS USING THE SAME | DSM IP ASSETS B.V (NL) | 2010-09-16 | — | — | WO | disclosed |