Docusate

Docusate

SCHEMBL466471

CCCCC(CC)COC(=O)CC(C(=O)OCC(CC)CCCC)S(=O)(=O)O.N

nearest known ligand 0.97

Full drug profile on Sugi Atlas →

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
RECQL P46063 1/20 0.97
CYP3A4 P08684 5/20 0.59
TSHR P16473 3/20 0.59
TDP1 Q9NUW8 2/20 0.59
ATM Q13315 1/20 0.59
ALDH1A1 P00352 7/20 0.46
CA2 P00918 4/20 0.46
LMNA P02545 4/20 0.42
MAPK1 P28482 3/20 0.42
HSD17B10 Q99714 1/20 0.41
PRSS1 P07477 1/20 0.41
PRSS2 P07478 1/20 0.41
PRSS3 P35030 1/20 0.41
L3MBTL1 Q9Y468 1/20 0.41
MMP9 P14780 1/20 0.36
MMP8 P22894 1/20 0.36
MMP14 P50281 1/20 0.36
CA1 P00915 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Docusate SCHEMBL2495512 0.99 RECQL (0.94) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL17179911 0.99 RECQL (0.94) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL30428709 0.99 RECQL (0.94) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL14547207 0.99 RECQL (1.00) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL21044605 0.99 RECQL (1.00) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL41958 0.99 RECQL (1.00) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL2384327 0.97 RECQL (0.92) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL23214391 0.97 RECQL (0.97) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL29959 0.97 RECQL (0.97) RECQLCYP3A4TSHRTDP1ATM
Docusate SCHEMBL1996246 0.97 RECQL (0.97) RECQLCYP3A4TSHRTDP1ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012079997-A2 COSMETIC COMPOSITION COMPRISING AN IMIDOPEROXYCARBOXYLIC ACID DERIVATIVE A BIS-ALKYL SULPHOSUCCINATE DERIVATIVE AND A 2-ACRYLAMIDO-2-METHYLPROPANESULPHONIC ACID COPOLYMER L'OREAL (FR) 2012-06-21 WO claimed
EP-1716587-A2 PROCESS AND APPARATUS FOR REMOVING RESIDUES FROM SEMICONDUCTOR SUBSTRATES BATTELLE MEMORIAL INSTITUTE (US) 2006-11-02 EP claimed
WO-2005081289-A2 PROCESS AND APPARATUS FOR REMOVING RESIDUES FROM SEMICONDUCTOR SUBSTRATES BATTELLE MEMORIAL INSTITUTE (US) 2005-09-01 WO claimed
US-20050183740-A1 Process and apparatus for removing residues from semiconductor substrates BATTELLE MEMORIAL INSTITUTE 2005-08-25 US claimed
EP-3263612-B1 POLYMER POWDER, CURABLE RESIN COMPOSITION AND CURED MATERIAL THEREOF MITSUBISHI CHEM CORP (JP) 2020-08-05 EP disclosed
CN-107531069-B Thermosensitive recording material and method for producing same 富士胶片株式会社 2020-07-10 CN disclosed
WO-2019189458-A1 LATENT CURING CATALYST FOR EPOXY RESIN AND EPOXY RESIN COMPOSITION USING SAME ナガセケムテックス株式会社 2019-10-03 WO disclosed
US-20180201885-A1 DEFECT REDUCTION RINSE SOLUTION CONTAINING AMMONIUM SALTS OF SULFOESTERS BASF SE (DE) 2018-07-19 US disclosed
EP-3263612-A1 POLYMER POWDER, CURABLE RESIN COMPOSITION AND CURED MATERIAL THEREOF Mitsubishi Chemical Corporation (JP) 2018-01-03 EP disclosed
CN-106455552-A Solid herbicidal composition comprising safener 美国陶氏益农公司 2017-02-22 CN disclosed
US-9522997-B2 Polymer powder, curable resin composition and cured material thereof MITSUBISHI RAYON CO., LTD. (JP) 2016-12-20 US disclosed
CN-102307918-B Vinyl polymer powder, curable resin composition, and cured product MITSUBISHI RAYON CO.,LTD. (JP) 2016-04-27 CN disclosed
EP-2407497-A1 (METH)ACRYLATE POLYMER, RESIN COMPOSITION, AND MOLDED ARTICLE Mitsubishi Rayon Co., Ltd. (JP) 2012-01-18 EP disclosed
EP-1297967-B1 Thermal recording material and production method thereof FUJI PHOTO FILM CO LTD (JP) 2006-07-19 EP disclosed
US-7049269-B2 Thermal recording material and production method thereof FUJI PHOTO FILM CO., LTD. (JP) 2006-05-23 US disclosed
EP-0964036-B1 Water-based ball-point pen ink composition PILOT INK CO LTD (JP) 2003-08-27 EP disclosed
US-20030157427-A1 Thermal recording material and production method thereof FUJI PHOTO FILM CO., LTD. 2003-08-21 US disclosed
EP-1297967-A2 Thermal recording material and production method thereof FUJI PHOTO FILM CO., LTD. (JP) 2003-04-02 EP disclosed
US-20020122920-A1 Adhesive recording paper FUJI PHOTO FILM CO., LTD. 2002-09-05 US disclosed
US-4492589-A CONTAINING CARBOXYSULFONATE DIAMOND SHAMROCK CHEMICALS COMPANY (US) 1985-01-08 US disclosed