⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL675848 | 0.70 | — | — | |
| SCHEMBL4289154 | 0.69 | — | — | |
| SCHEMBL5582825 | 0.69 | CYP19A1 (0.31) | — | |
| SCHEMBL18204184 | 0.69 | — | — | |
| SCHEMBL220699 | 0.68 | — | — | |
| SCHEMBL189482 | 0.68 | — | — | |
| SCHEMBL161708 | 0.68 | — | — | |
| SCHEMBL165725 | 0.68 | — | — | |
| SCHEMBL9625106 | 0.68 | — | — | |
| SCHEMBL9625483 | 0.68 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4916255-A | Method for production of methacrylate ester | HITACHI, LTD. (JP) | 1990-04-10 | — | — | US | claimed |
| CN-106103396-B | Compound, resin, material for forming underlayer film for lithography, pattern formation method, and method for purifying compound or resin | 三菱瓦斯化学株式会社 | 2021-11-30 | — | — | CN | disclosed |
| CN-107848983-B | Compound, resin, material for forming underlayer film for lithography, resist pattern, method for forming circuit pattern, and method for purifying resist pattern | 三菱瓦斯化学株式会社 | 2021-07-09 | — | — | CN | disclosed |
| CN-107428646-B | Compounds, resins, and methods for their purification, and uses thereof | 三菱瓦斯化学株式会社 | 2021-03-02 | — | — | CN | disclosed |
| CN-107406383-B | Compound for lithography, resin, and underlayer film forming material | 三菱瓦斯化学株式会社 | 2021-01-26 | — | — | CN | disclosed |
| CN-107924131-B | Underlayer film-forming material for lithography, use of composition thereof for forming underlayer film for lithography, and method for forming resist pattern | 三菱瓦斯化学株式会社 | 2020-12-25 | — | — | CN | disclosed |
| US-9605118-B2 | Film and method for manufacturing the same, optical film, polarizer-protecting film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2017-03-28 | — | — | US | disclosed |
| CN-106103396-A | Compound, resin, lower layer film for lithography form material, lower layer film for lithography, pattern formation method and compound or the purification process of resin | 三菱瓦斯化学株式会社 | 2016-11-09 | — | — | CN | disclosed |
| EP-1984316-A1 | NORBORNENYLMETHYL FLUOROALKYL ETHERS | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2008-10-29 | — | — | EP | disclosed |
| WO-2007095361-A1 | NORBORNENYLMETHYL FLUOROALKYL ETHERS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-08-23 | — | — | WO | disclosed |
| WO-1993002135-A1 | IMPROVED THERMOPLASTIC COMPOSITION OF POLYPROPYLENE AND STYRENE COPOLYMER RESINS | EXXON CHEMICAL PATENTS INC. (US) | 1993-02-04 | — | — | WO | disclosed |
| EP-0518949-A1 | NOVEL HETEROCYCLIC NITROGEN COMPOUND MANNICH BASE DERIVATIVES OF AMINO-SUBSTITUTED POLYMERS FOR OLEAGINOUS COMPOSITIONS. | EXXON CHEMICAL PATENTS INC (US) | 1992-12-23 | — | — | EP | disclosed |
| US-5153282-A | Preparation of polyolefin incorporating functional groups from masked functional group-containing monomers | EXXON CHEMICAL PATENTS INC. (US) | 1992-10-06 | — | — | US | disclosed |
| EP-0295076-B1 | POLYOLEFINS INCORPORATING FUNCTIONAL GROUPS, MASKED FUNCTIONAL GROUP-CONTAINING MONOMERS, REACTION MIXTURES, AND METHODS FOR PREPARING SAME | EXXON CHEMICAL PATENTS INC. (US) | 1992-09-30 | — | — | EP | disclosed |
| WO-1991013954-A1 | NOVEL HETEROCYCLIC NITROGEN COMPOUND MANNICH BASE DERIVATIVES OF AMINO-SUBSTITUTED POLYMERS FOR OLEAGINOUS COMPOSITIONS | EXXON CHEMICAL PATENTS INC. (US) | 1991-09-19 | — | — | WO | disclosed |
| WO-1991013953-A1 | NOVEL DISPERSANT VISCOSITY INDEX IMPROVER COMPOSITIONS | EXXON CHEMICAL PATENTS INC. (US) | 1991-09-19 | — | — | WO | disclosed |
| US-5030370-A | Polymer of a metal-masked amino-substituted monomer and an alpha-olefin which was subsequently deashed | EXXON CHEMICAL PATENTS INC. (US) | 1991-07-09 | — | — | US | disclosed |
| EP-0432939-A2 | Oil soluble amino-substituted polymers containing graft polymer segments derived form aromatic nitrogen-containing monomers | EXXON CHEMICAL PATENTS INC. (US) | 1991-06-19 | — | — | EP | disclosed |
| US-4987200-A | METALLIZATION BEFORE POLYMERIZATION | EXXON CHEMICAL PATENTS INC. (US) | 1991-01-22 | — | — | US | disclosed |
| EP-0295076-A1 | Polyolefins incorporating functional groups, masked functional group-containing monomers, reaction mixtures, and methods for preparing same | EXXON CHEMICAL PATENTS INC. (US) | 1988-12-14 | — | — | EP | disclosed |