SCHEMBL4671069

SCHEMBL4671069

C=C(C)C(=O)CCCOP(=O)(O)O

nearest known ligand 0.47

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
LPAR3 Q9UBY5 9/20 0.47
LPAR2 Q9HBW0 8/20 0.47
LPAR1 Q92633 6/20 0.47
BTN3A1 O00481 1/20 0.42
ENPP2 Q13822 2/20 0.34
LPAR6 P43657 1/20 0.34
LPAR4 Q99677 1/20 0.34
LPAR5 Q9H1C0 1/20 0.34
PEPD P12955 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7619686 0.94 LPAR3 (0.50) LPAR3LPAR2LPAR1BTN3A1ENPP2
SCHEMBL7622214 0.93 LPAR3 (0.53) LPAR3LPAR2LPAR1BTN3A1ENPP2
SCHEMBL379190 0.93 LPAR3 (0.53) LPAR3LPAR2LPAR1BTN3A1ENPP2
SCHEMBL17977194 0.93 LPAR3 (0.53) LPAR3LPAR2LPAR1BTN3A1ENPP2
SCHEMBL3915637 0.93 LPAR3 (0.53) LPAR3LPAR2LPAR1BTN3A1ENPP2
SCHEMBL3680097 0.93 LPAR3 (0.53) LPAR3LPAR2LPAR1BTN3A1ENPP2
SCHEMBL1926070 0.88 BTN3A1 (0.48) LPAR3LPAR2LPAR1BTN3A1ENPP2
SCHEMBL4796215 0.86 CYP3A4 (0.45) LPAR3LPAR2LPAR1BTN3A1
SCHEMBL4671117 0.85 BTN3A1 (0.47) LPAR3LPAR2LPAR1BTN3A1
SCHEMBL18425154 0.82 LPAR3 (0.50) LPAR3LPAR2LPAR1BTN3A1ENPP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7193226-B2 Scratch resistant moisture-protecting parylene layers AGFA-GEVAERT (BE) 2007-03-20 US claimed
EP-1541333-A1 Scratch resistant moisture-protecting parylene layers Agfa-Gevaert (BE) 2005-06-15 EP claimed
US-20050067584-A1 Scratch resistant moisture-protecting parylene layers AGFA NV (BE) 2005-03-31 US claimed
US-20090092801-A1 NONAQUEOUS INKJET INK, INK COMPOSITION FOR INKJET RECORDING, AND SUBSTRATE FOR COLOR FILTER TOYO INK MANUFACTURING CO., LTD. (JP) 2009-04-09 US disclosed
EP-1998338-A1 Needle image plate or panel suitable for use in CR or DR imaging. Agfa HealthCare NV (BE) 2008-12-03 EP disclosed
US-7384989-B2 Coating material, method for production and use thereof for production of adhesive, corrosion-resistant coatings BASF COATINGS AG (DE) 2008-06-10 US disclosed
US-7193226-B2 Scratch resistant moisture-protecting parylene layers AGFA-GEVAERT (BE) 2007-03-20 US disclosed
US-20060014865-A1 Coating material, method for production and use thereof for production of adhesive, corrosion-resistant coatings BASF COATINGS AKTIENGESELLSCHAFT, GLASURITSTR. 1 (DE) 2006-01-19 US disclosed
EP-1541333-A1 Scratch resistant moisture-protecting parylene layers Agfa-Gevaert (BE) 2005-06-15 EP disclosed
US-20050067584-A1 Scratch resistant moisture-protecting parylene layers AGFA NV (BE) 2005-03-31 US disclosed
EP-0844006-B1 Liquid-absorbing material composition, molded product therefrom, process for preparing the same and use thereof SHOWA DENKO KK (JP) 2002-06-05 EP disclosed
EP-0844006-A1 Liquid-absorbing material composition, molded product therefrom, process for preparing the same and use thereof SHOWA DENKO KABUSHIKI KAISHA (JP) 1998-05-27 EP disclosed
EP-0446636-B1 External application base or auxiliary agent and external application composition for human being or animal containing the same SHOWA DENKO KK (JP) 1996-06-12 EP disclosed
US-5455042-A Ointment comprising a homogenous mixture of a polymer or copolymer of N-vinylacetamide, water and/or alcohols, and a pharmacologically active component SHOWA DENKO KABUSHIKI KAISHA (JP) 1995-10-03 US disclosed
US-5344655-A Drug delivery SHOWA DENKO K.K. (JP) 1994-09-06 US disclosed
US-5254338-A N-vinylacetamide polymer SHOWA DENKO K.K. (JP) 1993-10-19 US disclosed
EP-0446636-A2 External application base or auxiliary agent and external application composition for human being or animal containing the same SHOWA DENKO KABUSHIKI KAISHA (JP) 1991-09-18 EP disclosed
EP-0226193-B1 PROCESS FOR THE ADHESION OF POLY-P-XYLYLENE TO SUBSTRATES AND MANUFACTURED ARTICLES Montedison S.p.A. (IT) 1990-09-12 EP disclosed
US-4784881-A Process for the adhesion of poly-p-xylylene to substrates by means of phosphoric acid ester primers MONTEDISON S.P.A (IT) 1988-11-15 US disclosed
EP-0226193-A1 Process for the adhesion of poly-P-xylylene to substrates and manufactured articles Montedison S.p.A. (IT) 1987-06-24 EP disclosed