SCHEMBL467143

SCHEMBL467143

C=CCCCCCCC[Si](OCC)(OCC)OCC

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.48
ALDH1A1 P00352 2/20 0.41
LMNA P02545 3/20 0.37
LPAR3 Q9UBY5 2/20 0.37
MAPT P10636 2/20 0.33
ABCC4 O15439 1/20 0.33
LPAR2 Q9HBW0 1/20 0.33
TRPA1 O75762 1/20 0.31
USP2 O75604 1/20 0.30
CYP3A4 P08684 1/20 0.30
RECQL P46063 1/20 0.30
SMN1; SMN2 Q16637 1/20 0.30
TDP1 Q9NUW8 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL340242 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL466651 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL339809 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL6037340 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL2671563 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL1229805 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL1230086 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL467092 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL340547 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT
SCHEMBL340578 1.00 TSHR (0.48) TSHRALDH1A1LMNALPAR3MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8877857-B2 Polar group-containing copolymer, rubber composition and studless tire SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2014-11-04 US disclosed
EP-2404944-B1 POLAR GROUP-CONTAINING COPOLYMER, RUBBER COMPOSITION AND STUDLESS TIRE SUMITOMO RUBBER IND (JP) 2014-05-14 EP disclosed
CN-102365306-B Polar group-containing copolymer, rubber composition and studless tire SUMITOMO RUBBER IND 2014-04-02 CN disclosed
EP-2216682-B1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST ADEKA CORP (JP) 2013-07-17 EP disclosed
US-8211619-B2 Positive photosensitive composition, positive permanent resist, and method for producing positive permanent resist ADEKA CORPORATION (JP) 2012-07-03 US disclosed
US-20120095153-A1 POLAR GROUP-CONTAINING COPOLYMER, RUBBER COMPOSITION AND STUDLESS TIRE SUMITOMO RUBBER INDUSTRIES, LTD. (JP) 2012-04-19 US disclosed
CN-102365306-A Polar group-containing copolymer, rubber composition and studless tire SUMITOMO RUBBER IND 2012-02-29 CN disclosed
EP-2404944-A1 POLAR GROUP-CONTAINING COPOLYMER, RUBBER COMPOSITION AND STUDLESS TIRE Sumitomo Rubber Industries, Ltd. (JP) 2012-01-11 EP disclosed
US-20100273104-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST A D E K A (ADEKA CORPORATION) (JP) 2010-10-28 US disclosed
EP-2216682-A1 POSITIVE PHOTOSENSITIVE COMPOSITION, POSITIVE PERMANENT RESIST, AND METHOD FOR PRODUCING POSITIVE PERMANENT RESIST Adeka Corporation (JP) 2010-08-11 EP disclosed