⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30477896 | 1.00 | — | — | |
| SCHEMBL1704849 | 0.72 | — | — | |
| SCHEMBL30549393 | 0.72 | — | — | |
| SCHEMBL11590195 | 0.72 | — | — | |
| SCHEMBL11622512 | 0.72 | — | — | |
| SCHEMBL13771797 | 0.69 | — | — | |
| SCHEMBL28456105 | 0.69 | — | — | |
| SCHEMBL18239351 | 0.69 | — | — | |
| SCHEMBL30153668 | 0.67 | — | — | |
| SCHEMBL22664853 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 190 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-112080279-A | Etching composition | 关东鑫林科技股份有限公司 | 2020-12-15 | — | — | CN | claimed |
| CN-102190923-B | Treatment solution, ink group and image forming method | FUJI FILM CORP. (JP) | 2015-08-26 | — | — | CN | claimed |
| US-4132686-A | POLYCARBOXYLIC ACID RESIN WITH AN AMINO RESIN OR A NEUTRALIZING AGENT | SHINTO PAINT CO., LTD. (JP) | 1979-01-02 | — | — | US | claimed |
| JP-2163029-A | — | — | None | — | — | JP | disclosed |
| US-20260071117-A1 | FUNABLE FLUORESCENT COMPOUNDS AND USES THEREOF | UNIV ARIZONA (US) | 2026-03-12 | — | — | US | disclosed |
| US-12567515-B2 | Conductive film, touch panel, photosensitive resin composition, and method of manufacturing conductive film | FUJIFILM CORPORATION (JP) | 2026-03-03 | — | — | US | disclosed |
| CN-115335925-B | Conductive film, touch panel, photosensitive resin composition, and method for producing conductive film | 富士胶片株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-113316758-B | Touch panel and method for manufacturing touch panel | 富士胶片株式会社 | 2024-11-12 | — | — | CN | disclosed |
| EP-3858631-B1 | PRETREATMENT LIQUID, INK SET, AND IMAGE RECORDING METHOD | FUJIFILM CORP (JP) | 2024-09-18 | — | — | EP | disclosed |
| US-12036783-B2 | Pretreatment liquid, ink set, and image recording method | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| EP-4310081-A1 | CTLA-4 SMALL MOLECULE DEGRADATION AGENT AND APPLICATION THEREOF | Suzhou Guokuang Pharmtech. Co., Ltd. (CN) | 2024-01-24 | — | — | EP | disclosed |
| WO-2000010977-A9 | CATALYTIC ASYMMETRIC AMINOHYDROXYLATION WITH AMINO-SUBSTITUTED HETEROCYCLES | SCRIPPS RESEARCH INST (US) | 2000-12-14 | — | — | WO | disclosed |
| WO-2000010977-A1 | CATALYTIC ASYMMETRIC AMINOHYDROXYLATION WITH AMINO-SUBSTITUTED HETEROCYCLES | THE SCRIPPS RESEARCH INSTITUTE (US) | 2000-03-02 | — | — | WO | disclosed |
| US-5871861-A | Lithium ion secondary cell | MITSUBISHI CHEMICAL CORPORATION (JP) | 1999-02-16 | — | — | US | disclosed |
| US-5585214-A | WEAR RESISTANCE | CANON KABUSHIKI KAISHA (JP) | 1996-12-17 | — | — | US | disclosed |
| CN-1108656-A | N-azinyl-N'-(HET)arylsulphonyl-ureas | BAYER AG (DE) | 1995-09-20 | — | — | CN | disclosed |
| JP-H02163029-A | METHOD OF INSECT PEST CONTROL FOR FURNITURE | EIDAI CO LTD | 1990-06-22 | — | — | JP | disclosed |
| CN-1007965-B | COMPOSITE POROUS MATERCAL, PROCESS FOR PRODUCTION AND SEPARATION OF METALLIC | ASAHI CHEMICAL IND (JP) | 1990-05-16 | — | — | CN | disclosed |
| CN-85108961-A | The separation method of composite porous and production method and metallic element | — | 1986-06-10 | — | — | CN | disclosed |
| US-4132686-A | POLYCARBOXYLIC ACID RESIN WITH AN AMINO RESIN OR A NEUTRALIZING AGENT | SHINTO PAINT CO., LTD. (JP) | 1979-01-02 | — | — | US | disclosed |