SCHEMBL467718

SCHEMBL467718

ClC[Si](Cl)(Cl)CCl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1262109 0.74
SCHEMBL9559557 0.74
SCHEMBL133149 0.71
SCHEMBL467839 0.69
SCHEMBL4074079 0.69
Methane SCHEMBL29219028 0.67
SCHEMBL17966546 0.67
SCHEMBL124324 0.63
SCHEMBL309945 0.63
SCHEMBL31678139 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-107835815-B Process for preparing bis (chloromethyl) dichlorosilane and bis (chloromethyl) (aryl) chlorosilane 陶氏环球技术有限责任公司 2021-02-26 CN claimed
EP-3303351-B1 A PROCESS FOR THE PREPARATION OF BIS(CHLOROMETHYL)DICHLOROSILANE AND BIS(CHLOROMETHYL)(ARYL)CHLOROSILANE DOW GLOBAL TECHNOLOGIES LLC (US) 2019-10-09 EP claimed
US-10167301-B2 Process for the preparation of bis(chloromethyl)dichlorosilane and bis(chloromethyl)(aryl)chlorosilane DOW GLOBAL TECHNOLOGIES LLC (US) 2019-01-01 US claimed
US-20180155369-A1 A PROCESS FOR THE PREPARATION OF BIS(CHLOROMETHYL)DICHLOROSILANE AND BIS(CHLOROMETHYL)(ARYL)CHLOROSILANE DOW GLOBAL TECHNOLOGIES LLC (US) 2018-06-07 US claimed
EP-3303351-A1 A PROCESS FOR THE PREPARATION OF BIS(CHLOROMETHYL)DICHLOROSILANE AND BIS(CHLOROMETHYL)(ARYL)CHLOROSILANE Dow Global Technologies LLC (US) 2018-04-11 EP claimed
WO-2016191441-A1 A PROCESS FOR THE PREPARATION OF BIS(CHLOROMETHYL)DICHLOROSILANE AND BIS(CHLOROMETHYL)(ARYL)CHLOROSILANE DOW GLOBAL TECHNOLOGIES LLC (US) 2016-12-01 WO claimed
US-12554198-B2 Functional hydrogen silsesquioxane resins and the use thereof PIBOND OY (FI) 2026-02-17 US disclosed
CN-111607089-B Functional polyhydrosilsesquioxane resin compositions, methods of producing the same, and uses thereof 彼博股份有限公司 2023-10-10 CN disclosed
US-20220162391-A1 Functional hydrogen silsesquioxane resins and the use thereof PIBOND OY (FI) 2022-05-26 US disclosed
EP-3931639-A1 FUNCTIONAL HYDROGEN SILSESQUIOXANE RESINS AND THE USE THEREOF Pibond Oy (FI) 2022-01-05 EP disclosed
CN-107835815-B Process for preparing bis (chloromethyl) dichlorosilane and bis (chloromethyl) (aryl) chlorosilane 陶氏环球技术有限责任公司 2021-02-26 CN disclosed
CN-107835815-B Process for preparing bis (chloromethyl) dichlorosilane and bis (chloromethyl) (aryl) chlorosilane 陶氏环球技术有限责任公司 2021-02-26 CN disclosed
CN-107835815-B Process for preparing bis (chloromethyl) dichlorosilane and bis (chloromethyl) (aryl) chlorosilane 陶氏环球技术有限责任公司 2021-02-26 CN disclosed
EP-2069082-A2 HYDROPHOBIC AND OLEOPHOBIC COATING AND METHOD FOR PREPARING THE SAME Sonic Innovations, Inc. (US) 2009-06-17 EP disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed
US-20090076316-A1 PROCESS FOR PRODUCTION OF AROMATIC HYDROCARBON Ichikawa, Masaru (JP) 2009-03-19 US disclosed
US-7463400-B1 Electrochromic display device FUJI XEROX CO., LTD. (JP) 2008-12-09 US disclosed
US-20080240479-A1 HYDROPHOBIC AND OLEOPHOBIC COATING AND METHOD FOR PREPARING THE SAME SONIC INNOVATIONS, INC. 2008-10-02 US disclosed
WO-2008042986-A2 HYDROPHOBIC AND OLEOPHOBIC COATING AND METHOD FOR PREPARING THE SAME SONIC INNOVATIONS, INC. (US) 2008-04-10 WO disclosed
US-6284365-B1 FOR CONTROLLING PHYSICAL PROPERTIES OF SURFACE AND INTERFACE OF SOLID ARTICLE SUCH AS WETTABILITY, ADHESIVE PROPERTY, SURFACE ENERGY, DISPERSABILITY, CHEMICAL RESISTANCE FUJI XEROX CO., LTD. (JP) 2001-09-04 US disclosed