SCHEMBL467804

SCHEMBL467804

ClCC[SiH2]Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Chloromethane SCHEMBL11719039 0.92
SCHEMBL897281 0.75
SCHEMBL3696820 0.75
SCHEMBL2684809 0.70 TSHR (0.40)
Chloromethane SCHEMBL9785355 0.67
SCHEMBL16855306 0.67
SCHEMBL467835 0.64
SCHEMBL7992210 0.62
SCHEMBL2271925 0.61
SCHEMBL29774069 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5968611-A VAPOR DEPOSITION OF SILICON NITRIDE FILMS ON A SUBSTRATE BY REACTION OF HALOALKYLSILANE WITH NITROGEN COMPOUND THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 1999-10-19 US claimed
WO-1999027154-A1 SILICON NITROGEN-BASED FILMS AND METHOD OF MAKING THE SAME GELEST, INC. (US) 1999-06-03 WO claimed
CN-109485857-B Preparation method of liquid polycarbosilane 航天材料及工艺研究所 2021-08-10 CN disclosed
CN-107223127-A Method for producing organohalosilanes 美国道康宁公司 2017-09-29 CN disclosed
CN-107206355-A The method for preparing organo-halogen-silane 美国道康宁公司 2017-09-26 CN disclosed
US-9512272-B2 Curable composition containing silicone, and cured product thereof CENTRAL GLASS COMPANY, LIMITED (JP) 2016-12-06 US disclosed
EP-2386561-B1 Methods for producing alkoxyhydrosilanes KANEKA CORP (JP) 2016-01-13 EP disclosed
EP-2392600-B1 Polymer having a reactive silicon-containing group, methods for its preparation and a curable composition comprising the polymer KANEKA CORP (JP) 2015-12-23 EP disclosed
US-20150322211-A1 Curable Composition Containing Silicone, and Cured Product Thereof CENTRAL GLASS COMPANY, LIMITED (JP) 2015-11-12 US disclosed
EP-2308884-B1 METHOD FOR PRODUCING -HETERO-SUBSTITUTED ALKYLHALOHYDROSILANE AND USE THEREOF KANEKA CORP (JP) 2015-05-06 EP disclosed
US-20120196981-A1 METHOD FOR PRODUCING a-HETERO-SUBSTITUTED ALKYLHALOHYDROSILANE AND USE THEREOF KANEKACORPORATION (JP) 2012-08-02 US disclosed
EP-2308884-A1 METHOD FOR PRODUCING -HETERO-SUBSTITUTED ALKYLHALOHYDROSILANE AND USE THEREOF Kaneka Corporation (JP) 2011-04-13 EP disclosed
US-7319129-B2 Silsesquioxane derivative and process for producing the same CHISSO CORPORATION (JP) 2008-01-15 US disclosed
US-20060052623-A1 Having two cyclotetrasiloxne rings connected by O-Si groups obtained through hydrolysis and condensation of trifunctional hydrolyzable silicon compounds; functionalization; fireproofing, thermostability, weathproofing, photostability, dielectric, hardness, strength and chemical resistance CHISSO CORPORATION (JP) 2006-03-09 US disclosed
US-20040068074-A1 Production process for silsesquioxane derivative having functional group and silsesquioxane derivative JNC CORPORATION (JP) 2004-04-08 US disclosed
US-5968611-A VAPOR DEPOSITION OF SILICON NITRIDE FILMS ON A SUBSTRATE BY REACTION OF HALOALKYLSILANE WITH NITROGEN COMPOUND THE RESEARCH FOUNDATION OF STATE UNIVERSITY OF NEW YORK (US) 1999-10-19 US disclosed
WO-1999027154-A1 SILICON NITROGEN-BASED FILMS AND METHOD OF MAKING THE SAME GELEST, INC. (US) 1999-06-03 WO disclosed
EP-0148026-B1 FUNGICIDAL IMIDAZOLES AND TRIAZOLES E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-04-19 EP disclosed
US-4530922-A Fungicidal imidazoles and triazoles containing silicon E. I. DU PONT DE NEMOURS AND COMPANY (US) 1985-07-23 US disclosed
EP-0148026-A2 Fungicidal imidazoles and triazoles E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-07-10 EP disclosed