⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4686471 | 0.85 | — | — | |
| SCHEMBL4687436 | 0.85 | — | — | |
| SCHEMBL5850474 | 0.81 | — | — | |
| SCHEMBL15856320 | 0.80 | — | — | |
| SCHEMBL14469725 | 0.80 | — | — | |
| SCHEMBL4821655 | 0.78 | — | — | |
| SCHEMBL24760223 | 0.77 | — | — | |
| SCHEMBL19818073 | 0.77 | — | — | |
| SCHEMBL21567778 | 0.77 | — | — | |
| SCHEMBL3463018 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1352904-B1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | MITSUBISHI RAYON CO (JP) | 2008-10-08 | — | — | EP | claimed |
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| US-8791288-B2 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-07-29 | — | — | US | disclosed |
| EP-1354897-B1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | DAICEL CHEM (JP) | 2012-10-24 | — | — | EP | disclosed |
| EP-2463714-A1 | Basic compound, chemically amplified resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-06-13 | — | — | EP | disclosed |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304295-A1 | ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-12-02 | — | — | US | disclosed |
| EP-1352904-B1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | MITSUBISHI RAYON CO (JP) | 2008-10-08 | — | — | EP | disclosed |
| US-7339014-B2 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO., LTD. (JP) | 2008-03-04 | — | — | US | disclosed |
| EP-1288186-B1 | Preparation process of vinyl ether compounds | DAICEL CHEM (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-7105268-B2 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-7074970-B2 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2006-07-11 | — | — | US | disclosed |
| US-7041838-B2 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI RAYON CO., LTD. (JP) | 2006-05-09 | — | — | US | disclosed |
| US-20050113538-A1 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO.,LTD. (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-04-01 | — | — | US | disclosed |
| EP-1354897-A1 | POLYMER FOR PHOTORESIST AND RESIN COMPOSITIONS THEREFOR | Daicel Chemical Industries, Ltd. (JP) | 2003-10-22 | — | — | EP | disclosed |
| EP-1352904-A1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-10-15 | — | — | EP | disclosed |
| US-20030148210-A1 | Polymer for photoresist and resin compositions therefor | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-08-07 | — | — | US | disclosed |
| US-20030083529-A1 | Process for producing vinyl ether compounds | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2003-05-01 | — | — | US | disclosed |
| EP-1288186-A2 | Vinyl ether compounds and preparation process thereof | Daicel Chemical Industries, Ltd. (JP) | 2003-03-05 | — | — | EP | disclosed |