SCHEMBL4710446

SCHEMBL4710446

SCOc1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Anisole SCHEMBL10880224 0.88 CA4 (0.64)
SCHEMBL890923 0.84 NQO1 (0.47)
SCHEMBL891062 0.80 TP53 (0.45)
SCHEMBL55955 0.78 HDAC3 (0.71)
SCHEMBL17053676 0.77
Benzene SCHEMBL22129849 0.77 KDM4E (0.44)
SCHEMBL1493177 0.76 HDAC3 (0.83)
Iodide SCHEMBL11293378 0.76 HDAC3 (0.68)
SCHEMBL27962 0.75 KCNA3 (0.82)
SCHEMBL497461 0.75 KCNA3 (0.63)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 64 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118159584-A Curable resin composition and cured product thereof 株式会社大赛璐 2024-06-07 CN disclosed
WO-2024048612-A1 CURABLE COMPOSITION, CURED PRODUCT, AND METHOD FOR PRODUCING CURED PRODUCT 株式会社クレハ 2024-03-07 WO disclosed
CN-110869355-B Benzopyran compound, curable composition containing the compound, and optical article containing cured product formed from the curable composition 株式会社德山 2023-11-14 CN disclosed
CN-112424260-B Photochromic compound and curable composition containing the same 株式会社德山 2023-10-13 CN disclosed
US-20230257408-A1 METHOD FOR PRODUCING OPTICALLY ACTIVE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-17 US disclosed
EP-4186882-A1 METHOD FOR PRODUCING OPTICALLY ACTIVE COMPOUND SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-05-31 EP disclosed
CN-113045885-B Transparent plastic substrate and plastic lens 豪雅镜片泰国有限公司 2023-03-21 CN disclosed
CN-115836041-A Process for producing optically active compound 住友化学株式会社 2023-03-21 CN disclosed
WO-2023009836-A1 SLC26A3 INHIBITORS AND USE THEREOF THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) 2023-02-02 WO disclosed
CN-113166311-B Composition for optical material and optical material 株式会社德山 2023-01-06 CN disclosed
CN-1291183-A N-hydroxy-2- (alkyl, aryl or heteroaryl sulfanyl, sulfinyl or sulfonyl) -3 substituted alkyl, aryl or heteroarylamides as matrix metalloproteinase inhibitors AMERICAN CYANAMID CO (US) 2001-04-11 CN disclosed
US-5955206-A POLYTHIOETHERS AND ACRYLATE OR VINYL GROUPS FOR CURING TO FORM OPTICAL LENSES MITSUI CHEMICALS, INC. (JP) 1999-09-21 US disclosed
US-5736609-A A POLYTHIO COMPOUND CONTAINING AT LEAST TWO MERCAPTO GROUPS, A POLYISO(THIO)CYANATE COMPOUND, AND A COMPOUND HAVING TWO OR MORE UNSATURATED REACTIVE GROUPS MITSUI TOATSU CHEMICALS, INC. (JP) 1998-04-07 US disclosed
CN-1158613-A New use and new derivatives of imidazole, their preparation, new intermediates obtained, their use as medicaments and pharmaceutical compositions containing them ROUSSEL UCLAF (FR) 1997-09-03 CN disclosed
EP-0194554-B1 PROCESS FOR PRODUCTION OF OXIME DERIVATIVES NIPPON ZEON CO., LTD. (JP) 1993-09-01 EP disclosed
US-4906768-A Process for production of oxime derivatives NIPPON ZEON CO., LTD. (JP) 1990-03-06 US disclosed
EP-0169254-B1 PROCESS FOR PURIFICATION OF 1,2-UNSATURATED CARBOXYLIC ACIDS AND/OR ESTERS THEREOF MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1987-11-11 EP disclosed
US-4625059-A TREATMENT WITH MERCAPTAN 501 Mitsubishi Petrochemical Company, Ltd. (JP) 1986-11-25 US disclosed
EP-0194554-A2 Process for production of oxime derivatives NIPPON ZEON CO., LTD. (JP) 1986-09-17 EP disclosed
EP-0169254-A1 Process for purification of 1,2-unsaturated carboxylic acids and/or esters thereof MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1986-01-29 EP disclosed