Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | GMNN | O75496 | 1/20 | 0.44 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | SHBG | P04278 | 1/20 | 0.43 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.40 |
| ▸ | CA12 | O43570 | 2/20 | 0.39 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | MMP2 | P08253 | 2/20 | 0.39 |
| ▸ | CA9 | Q16790 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18707170 | 1.00 | TP53 (0.46) | TP53KDM4EGMNNLMNAMAPT | |
| SCHEMBL1056494 | 1.00 | — | — | |
| SCHEMBL6663981 | 1.00 | TP53 (0.46) | TP53KDM4EGMNNLMNAMAPT | |
| SCHEMBL1053407 | 1.00 | — | — | |
| SCHEMBL5195 | 1.00 | — | — | |
| SCHEMBL8086336 | 1.00 | TP53 (0.46) | TP53KDM4EGMNNLMNAMAPT | |
| SCHEMBL18706728 | 1.00 | TP53 (0.46) | TP53KDM4EGMNNLMNAMAPT | |
| SCHEMBL11165174 | 1.00 | TP53 (0.46) | TP53KDM4EGMNNLMNAMAPT | |
| SCHEMBL8008434 | 0.97 | TP53 (0.44) | TP53KDM4EGMNNLMNAMAPT | |
| Ammonia Solution, Strong SCHEMBL11270348 | 0.97 | TP53 (0.44) | TP53KDM4EGMNNLMNAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2648675-A1 | HAIR RELAXING AND STRAIGHTENING COMPOSITIONS | International Flora Technologies, Ltd. (US) | 2013-10-16 | — | — | EP | claimed |
| WO-2012078658-A1 | HAIR RELAXING AND STRAIGHTENING COMPOSITIONS | INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) | 2012-06-14 | — | — | WO | claimed |
| US-20120148517-A1 | Hair Relaxing and Straightening Compositions | INTERNATIONAL FLORA TECHNOLOGIES, LTD. (US) | 2012-06-14 | — | — | US | claimed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8993212-B2 | Fluorine-containing sulfonic acid salts, photo-acid generator and resist composition and pattern formation method utilizing same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2015-03-31 | — | — | US | disclosed |
| US-8859181-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8859181-B2 | Chemically amplified negative resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-10-14 | — | — | US | disclosed |
| US-8632939-B2 | Polymer, chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-21 | — | — | US | disclosed |
| US-8632939-B2 | Polymer, chemically amplified positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-01-21 | — | — | US | disclosed |
| EP-2648675-A1 | HAIR RELAXING AND STRAIGHTENING COMPOSITIONS | International Flora Technologies, Ltd. (US) | 2013-10-16 | — | — | EP | disclosed |
| US-20130209938-A1 | Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same | CENTRAL GLASS COMPANY, LTD. (JP) | 2013-08-15 | — | — | US | disclosed |
| US-20110212390-A1 | CHEMICALLY AMPLIFIED NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |
| US-20110212391-A1 | POLYMER, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-09-01 | — | — | US | disclosed |
| EP-2362267-A1 | Chemically amplified negative resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-31 | — | — | EP | disclosed |
| EP-2362268-A1 | Polymer, chemically amplified positive resist composition and pattern forming process | Shin-Etsu Chemical Co., Ltd. (JP) | 2011-08-31 | — | — | EP | disclosed |
| WO-2010140483-A1 | FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST COMPOSITION, TOP COAT COMPOSITION AND PATTERN FORMATION METHOD | セントラル硝子株式会社 (JP) | 2010-12-09 | — | — | WO | disclosed |
| WO-2008046950-A1 | P,S-TYPE BIDENTATE CHIRAL LIGANDS AND USE THEREOF IN THE PAUSON-KHAND REACTION | ENANTIA, S.L. (ES) | 2008-04-24 | — | — | WO | disclosed |
| EP-0531715-B1 | Process for producing alcohols and ketones | SUMITOMO CHEMICAL CO (JP) | 1997-11-05 | — | — | EP | disclosed |
| US-5426237-A | Oxidation of straight, branched or cyclic alkanes and benzene derivatives in presence of transition metal catalyst and aldehyde | SUMITOMO CHEMICAL CO., LTD. (JP) | 1995-06-20 | — | — | US | disclosed |
| EP-0531715-A1 | Process for producing alcohols and ketones | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1993-03-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120148517-A1 | Hair Relaxing and Straightening Compositions | PDE6G, SHH, DNMT3L | TP53 4708/4885KDM4E 666/4885GMNN 2207/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.