SCHEMBL4743867

SCHEMBL4743867

NC(=O)C=CC1CCC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL532572 0.95 GRIN1 (0.39)
SCHEMBL3114037 0.93 GRIN1 (0.41)
SCHEMBL163417 0.93 GRIN1 (0.41)
SCHEMBL4079497 0.93 GRIN1 (0.41)
SCHEMBL730203 0.90 HDAC2 (0.34)
SCHEMBL543403 0.90
SCHEMBL6360578 0.81 EPHX2 (0.33)
SCHEMBL3260263 0.79 TSHR (0.38)
SCHEMBL3260266 0.79 TSHR (0.38)
SCHEMBL29690385 0.78 KDM4E (0.48)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11492432-B2 Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2022-11-08 US disclosed
US-20200223125-A1 RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE JAPAN SCIENCE & TECH AGENCY (JP) 2020-07-16 US disclosed
US-20150298387-A1 RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2015-10-22 US disclosed
WO-2008108859-A1 BIOCOMPATIBLE, SURFACE MODIFIED MATERIALS BAUSCH & LOMB INCORPORATED (US) 2008-09-12 WO disclosed