Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 1/20 | 0.59 |
| ▸ | CYP1A2 | P05177 | 6/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 5/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 6/20 | 0.42 |
| ▸ | GRM4 | Q14833 | 6/20 | 0.41 |
| ▸ | GRM2 | Q14416 | 3/20 | 0.41 |
| ▸ | GRM3 | Q14832 | 3/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | GRM8 | O00222 | 2/20 | 0.41 |
| ▸ | GRM6 | O15303 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | GRM5 | P41594 | 1/20 | 0.41 |
| ▸ | MTOR | P42345 | 1/20 | 0.41 |
| ▸ | GRM1 | Q13255 | 1/20 | 0.41 |
| ▸ | PLCB1 | Q9NQ66 | 1/20 | 0.41 |
| ▸ | CYP2D6 | P10635 | 4/20 | 0.40 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28476541 | 0.80 | GRM4 (0.48) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| SCHEMBL4553189 | 0.78 | GRM4 (0.47) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| SCHEMBL2775001 | 0.78 | GRM4 (0.44) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| SCHEMBL27849837 | 0.76 | GRM4 (0.50) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| Hydrochloric Acid SCHEMBL628165 | 0.75 | GRM4 (0.42) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| Hydrochloric Acid SCHEMBL28453447 | 0.75 | GRM4 (0.42) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| Hydrochloric Acid SCHEMBL3272762 | 0.75 | GRM4 (0.42) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| SCHEMBL2229860 | 0.74 | SLC6A4 (1.00) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| SCHEMBL9088184 | 0.74 | SLC6A4 (0.55) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E | |
| SCHEMBL14158524 | 0.74 | SLC6A4 (1.00) | SLC6A4CYP1A2ALOX15ALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 71 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024058317-A1 | REJUVENATING SKIN SOFTENER TYPE COSMETIC COMPOSITION AND PREPARATION METHOD THEREFOR | 주식회사 바노바기 | 2024-03-21 | — | — | WO | claimed |
| CN-101679633-B | Resin composition for forming heat-cured film | NISSAN CHEMICAL IND LTD | 2012-09-19 | — | — | CN | claimed |
| CN-118139912-A | Method for producing polyimide, polyimide resin composition, and cured product thereof | 东丽株式会社 | 2024-06-04 | — | — | CN | disclosed |
| CN-114524938-B | Polymer, photosensitive resin composition, cured film prepared from polymer and photosensitive resin composition, and electronic element | 江苏三月科技股份有限公司 | 2024-02-09 | — | — | CN | disclosed |
| CN-116829611-A | Reduction of monomeric isocyanates by porous materials | 巴斯夫欧洲公司 | 2023-09-29 | — | — | CN | disclosed |
| CN-110447005-A | Film with conductive layer, touch panel, method for manufacturing film with conductive layer, and method for manufacturing touch panel | TORAY INDUSTRIES | 2019-11-12 | — | — | CN | disclosed |
| CN-110431169-A | Semicrystalline polyamides composition, preparation method and its purposes with high glass-transition temperature and high melt temperature for thermoplastic material | ARKEMA FRANCE | 2019-11-08 | — | — | CN | disclosed |
| CN-108431088-A | Polyamide acid solution using diamine monomer having novel structure and polyimide film comprising same | 株式会社斗山 | 2018-08-21 | — | — | CN | disclosed |
| CN-108431086-A | Using alicyclic monomer polyamic acid composition and utilize its transparent polyimide film | 株式会社斗山 | 2018-08-21 | — | — | CN | disclosed |
| CN-102076774-B | Radiation-sensitive resin composition, laminate and method for producing the same, and semiconductor device | ZEON CORP | 2014-07-09 | — | — | CN | disclosed |
| CN-103476826-A | Polycarboxylic acid resin and composition thereof | NIPPON KAYAKU KK | 2013-12-25 | — | — | CN | disclosed |
| US-5417882-A | Data carriers and display elements | BASF AKTIENGESELLSCHAFT (DE) | 1995-05-23 | — | — | US | disclosed |
| EP-0630945-A1 | Use of reticulated azo dyes in non-linear optics | BASF Aktiengesellschaft (DE) | 1994-12-28 | — | — | EP | disclosed |
| US-5350873-A | Optically active phenoxypropionic esters | BASF AKTIENGESELLSCHAFT (DE) | 1994-09-27 | — | — | US | disclosed |
| CN-1024543-C | Preparation method of dicyclohexyl-3, 4, 3 ', 4' -tetracarboxylic acid | HITACHI CHEMICAL CO LTD (JP) | 1994-05-18 | — | — | CN | disclosed |
| CN-1085890-A | Dicyclohexyl-3, 4, 3 ', 4' -tetracarboxylic acid or dianhydride thereof and polyamide-acid and polyimide obtained therefrom | HITACHI CHEMICAL CO LTD (JP) | 1994-04-27 | — | — | CN | disclosed |
| EP-0583605-A1 | Defined oligomeric liquid crystalline compounds with smectic liquid crystalline phases | BASF Aktiengesellschaft (DE) | 1994-02-23 | — | — | EP | disclosed |
| EP-0528268-A2 | Optically active esters of phenoxypropionic acid | BASF Aktiengesellschaft (DE) | 1993-02-24 | — | — | EP | disclosed |
| EP-0504660-A2 | Liquid crystal compounds | BASF Aktiengesellschaft (DE) | 1992-09-23 | — | — | EP | disclosed |
| CN-1034707-A | Dicyclohexyl-3, 4, 3 ', 4' -tetracarboxylic acid or dianhydride thereof and polyamide-acid and polyimide obtained therefrom | HITACHI CHEMICAL CO LTD (JP) | 1989-08-16 | — | — | CN | disclosed |