Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MIF | P14174 | 1/20 | 0.42 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.36 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29202537 | 1.00 | MIF (0.42) | MIFHRH3ALDH1A1MEN1MAPT | |
| SCHEMBL16086198 | 0.88 | HRH3 (0.36) | MIFHRH3ALDH1A1MEN1MAPT | |
| SCHEMBL16086199 | 0.88 | HRH3 (0.36) | MIFHRH3ALDH1A1MEN1MAPT | |
| SCHEMBL3893969 | 0.86 | MAPK1 (0.41) | HRH3MAPK1SMN1; SMN2HPGDBTK | |
| SCHEMBL2533318 | 0.85 | HRH3 (0.41) | HRH3ALDH1A1MEN1MAPTHTT | |
| Ammonia Solution, Strong SCHEMBL27979051 | 0.84 | MAPK1 (0.40) | HRH3MAPK1HPGDBTKCHRM2 | |
| SCHEMBL4017541 | 0.84 | HRH3 (0.41) | HRH3ALDH1A1MEN1MAPTHTT | |
| SCHEMBL4017545 | 0.84 | HRH3 (0.41) | HRH3ALDH1A1MEN1MAPTHTT | |
| SCHEMBL17616824 | 0.83 | MIF (0.39) | MIFALDH1A1MEN1MAPTALOX15 | |
| SCHEMBL19204886 | 0.82 | MIF (0.36) | MIFALDH1A1MEN1MAPTALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7851575-B2 | Polycyclic polymers containing pendant ion conducting moieties | PROMERUS LLC (US) | 2010-12-14 | — | — | US | disclosed |
| US-7763412-B2 | Polymer, positive resist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-07-27 | — | — | US | disclosed |
| US-7651831-B2 | Positive photoresist composition with a polymer including a fluorosulfonamide group and process for its use | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-01-26 | — | — | US | disclosed |
| US-7638264-B2 | forming pattern on semiconductors; acrylic terpolymer with fluorosulfonamide-containing unit e.g. 2-trifluoromethanesulfonylaminoethyl methacrylate, second unit having pendant acid labile group, and third unit having a lactone moiety, and acid generator; good etch resistance and dissolution properties | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-12-29 | — | — | US | disclosed |
| US-7604918-B2 | Photosensitive polymer and photoresist composition having the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-10-20 | — | — | US | disclosed |
| US-7598016-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-06 | — | — | US | disclosed |
| US-7514204-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20090011365-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-01-08 | — | — | US | disclosed |
| EP-1132774-B1 | Polymer, resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2009-01-07 | — | — | EP | disclosed |
| US-20080241736-A1 | Immersion lithography; copolymer containing ammonium salt of carboxylic acid and fluorine monomer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080233514-A1 | POSITIVE PHOTORESIST COMPOSITION WITH A POLYMER INCLUDING A FLUOROSULFONAMIDE GROUP AND PROCESS FOR ITS USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-25 | — | — | US | disclosed |
| WO-2008106334-A2 | FLAME RETARDED STYRENIC POLYMER FOAMS AND FOAM PRECURSORS | ALBEMARLE CORPORATION (US) | 2008-09-04 | — | — | WO | disclosed |
| US-20080096131-A1 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. | 2008-04-24 | — | — | US | disclosed |
| US-20080063975-A1 | Polymer, Positive Resist Composition and Method for Forming Resist Pattern | TOKYO OHKA KOGYO CO., LTD (JP) | 2008-03-13 | — | — | US | disclosed |
| CN-1129578-C | Tetrahydrobenzindole derivatives | MEIJI SEIKA KAISHA (JP) | 2003-12-03 | — | — | CN | disclosed |
| CN-1286683-A | Tetrahydrobenzindole derivatives | MEIJI SEIKA KAISHA (JP) | 2001-03-07 | — | — | CN | disclosed |