SCHEMBL475884

SCHEMBL475884

CCCCC[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL502964 0.97 TSHR (0.53)
SCHEMBL2680240 0.97 TSHR (0.53)
SCHEMBL476072 0.97 TSHR (0.53)
SCHEMBL502670 0.97 TSHR (0.53)
SCHEMBL17090801 0.97 TSHR (0.53)
SCHEMBL475859 0.97 TSHR (0.53)
SCHEMBL3971104 0.97 TSHR (0.53)
SCHEMBL17090764 0.97 TSHR (0.53)
SCHEMBL2680343 0.97 TSHR (0.53)
SCHEMBL234264 0.97 TSHR (0.53)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 736 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117209461-A Organic photoelectric compound, composition with same and organic light-emitting device 浙江华显光电科技有限公司 2023-12-12 CN claimed
CN-115038741-A Curable formulations for forming low-k dielectric silicon-containing films using polycarbosilazanes 乔治洛德方法研究和开发液化空气有限公司 2022-09-09 CN claimed
EP-1785413-B1 ARYLSULFONIC ACID COMPOUND AND USE THEREOF AS ELECTRON-ACCEPTOR MATERIAL NISSAN CHEMICAL IND LTD (JP) 2014-01-22 EP claimed
EP-0594175-B1 Process for producing aromatic polycarbonate MITSUBISHI CHEM CORP (JP) 1997-06-18 EP claimed
US-5391691-A Melt condensing am aromatic diol compound and a carbonic acid diester in the presence of an interesterification catalyst and co-presence of an organosilicon compound MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1995-02-21 US claimed
EP-0594175-A1 Process for producing aromatic polycarbonate MITSUBISHI CHEMICAL CORPORATION (JP) 1994-04-27 EP claimed
CN-118344769-A Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element 日产化学工业株式会社 2024-07-16 CN disclosed
US-20240167155-A1 TIN COMPOUND, THIN-FILM FORMING RAW MATERIAL, THIN-FILM, METHOD FOR PRODUCING THIN-FILM, AND HALOGEN COMPOUND ADEKA CORPORATION (JP) 2024-05-23 US disclosed
CN-116157473-B Method for manufacturing substrate with organic functional film 日产化学株式会社 2024-05-10 CN disclosed
EP-3882234-B1 COBALT COMPLEX, METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING COBALT-CONTAINING THIN FILM TOSOH CORP (JP) 2024-05-08 EP disclosed
CN-117209461-B Organic photoelectric compound, composition with same and organic light-emitting device 浙江华显光电科技有限公司 2024-03-22 CN disclosed
CN-111836816-B Aniline derivatives and use thereof 日产化学株式会社 2023-12-19 CN disclosed
CN-117209461-A Organic photoelectric compound, composition with same and organic light-emitting device 浙江华显光电科技有限公司 2023-12-12 CN disclosed
EP-0256981-B1 TITANOCENES AND THEIR USE CIBA-GEIGY AG (CH) 1993-02-17 EP disclosed
EP-0517262-A1 Trifluorothymidine derivatives, process for producing the same and anti-cancer agent containing the same MITSUI TOATSU CHEMICALS, Inc. (JP) 1992-12-09 EP disclosed
US-4963470-A PHOTOINITIATORS CIBA-GEIGY CORPORATION (US) 1990-10-16 US disclosed
EP-0355800-A1 Process for the preparation of aryl-dimethyl-3-arylpropyl-silanes HOECHST AKTIENGESELLSCHAFT (DE) 1990-02-28 EP disclosed
US-4892962-A FROM ALLYL DIFLUOROACETATES AND A MONOCHLORO=SILANE, ADDITION POLYMERS CIBA-GEIGY CORPORATION (US) 1990-01-09 US disclosed
EP-0256981-A2 Titanocenes and their use CIBA-GEIGY AG (CH) 1988-02-24 EP disclosed
US-4692536-A Process for the preparation of hemiaminals, and the use thereof CIBA-GEIGY CORPORATION (US) 1987-09-08 US disclosed