⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14353373 | 0.81 | — | — | |
| SCHEMBL1714558 | 0.76 | — | — | |
| SCHEMBL28774597 | 0.76 | TDP1 (0.50) | — | |
| SCHEMBL136969 | 0.76 | — | — | |
| SCHEMBL28167750 | 0.72 | — | — | |
| Methane SCHEMBL28037662 | 0.72 | — | — | |
| Ethyne SCHEMBL28881511 | 0.69 | — | — | |
| Acetic Acid SCHEMBL9396048 | 0.67 | TDP1 (0.50) | — | |
| Cyclopropane SCHEMBL21879998 | 0.67 | — | — | |
| SCHEMBL28430097 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11947258-B2 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | Rohm and Hass Electronic Materials LLC (US) | 2024-04-02 | — | — | US | claimed |
| US-20230212112-A1 | PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | claimed |
| US-11613519-B2 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-03-28 | — | — | US | claimed |
| CN-111833736-A | Display device | 三星显示有限公司 | 2020-10-27 | — | — | CN | claimed |
| CN-110709110-A | Implant with modified properties | 赛特博恩医疗有限公司 | 2020-01-17 | — | — | CN | claimed |
| US-20170248844-A1 | PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-08-31 | — | — | US | claimed |
| US-8541495-B2 | Adhesive composition | TOAGOSEI CO., LTD. (JP) | 2013-09-24 | — | — | US | claimed |
| US-20110251318-A1 | ADHESIVE COMPOSITION | TOAGOSEI CO., LTD. (JP) | 2011-10-13 | — | — | US | claimed |
| EP-2371914-A1 | ADHESIVE COMPOSITION | Toagosei Co., Ltd (JP) | 2011-10-05 | — | — | EP | claimed |
| JP-11302602-A | — | — | None | — | — | JP | disclosed |
| US-12037422-B2 | Gel material | NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240175070-A1 | ANALYSIS APPARATUS AND ANALYSIS METHOD | CANON KABUSHIKI KAISHA (JP) | 2024-05-30 | — | — | US | disclosed |
| US-11947258-B2 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | Rohm and Hass Electronic Materials LLC (US) | 2024-04-02 | — | — | US | disclosed |
| US-20230212112-A1 | PHOTOACID-GENERATING MONOMER, POLYMER DERIVED THEREFROM, PHOTORESIST COMPOSITION INCLUDING THE POLYMER, AND METHOD OF FORMING A PHOTORESIST RELIEF IMAGE USING THE PHOTORESIST COMPOSITION | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| EP-0036813-B1 | (N-SUBSTITUTED CARBAMOYLOXY)ALKYLENEOXYHYDROCARBYL ACRYLATE ESTERS | UNION CARBIDE CORPORATION (US) | 1984-06-06 | — | — | EP | disclosed |
| EP-0037314-B1 | N-SUBSTITUTED CARBAMOYLOXY ALKANOYLOXYHYDROCARBYL ACRYLATE ESTERS | UNION CARBIDE CORPORATION (US) | 1984-02-15 | — | — | EP | disclosed |
| US-4364876-A | QUICK-SETTING ADHESIVES, COATINGS, MOLDING MATERIALS | TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) | 1982-12-21 | — | — | US | disclosed |
| US-4340497-A | CURABLE ACRYLIC COATING | UNION CARBIDE CORPORATION (US) | 1982-07-20 | — | — | US | disclosed |
| EP-0037314-A1 | N-substituted carbamoyloxy alkanoyloxyhydrocarbyl acrylate esters | UNION CARBIDE CORPORATION (US) | 1981-10-07 | — | — | EP | disclosed |
| EP-0036813-A1 | (N-Substituted carbamoyloxy)alkyleneoxyhydrocarbyl acrylate esters | UNION CARBIDE CORPORATION (US) | 1981-09-30 | — | — | EP | disclosed |