SCHEMBL4771435

SCHEMBL4771435

C[SiH](C)OCC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1052207 0.81 CA1 (0.31)
SCHEMBL9012527 0.73 CA1 (0.33)
SCHEMBL5098457 0.71
SCHEMBL798350 0.68 CA1 (0.38)
SCHEMBL677722 0.67 MAOB (0.31)
SCHEMBL10714079 0.63
SCHEMBL7892551 0.63
SCHEMBL5533086 0.62 CA1 (0.31)
SCHEMBL1050458 0.62 CA1 (0.31)
SCHEMBL8958437 0.62 CA1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1225194-B2 Method of forming a dielectric interlayer film with organosilicon precursors AIR PROD & CHEM (US) 2013-09-18 EP disclosed
EP-1225194-B1 Method of forming a dielectric interlayer film with organosilicon precursors AIR PROD & CHEM (US) 2008-10-01 EP disclosed
US-6583048-B2 Chemical vapor deposition from a silyl ether, a silyl ether oligomer, or an organosilicon compound containing one or more reactive groups, to form an interlayer dielectric film having a dielectric constant of 3.5 or less. AIR PRODUCTS AND CHEMICALS, INC. 2003-06-24 US disclosed
US-20020142579-A1 ORGANOSILICON PRECURSORS FOR INTERLAYER DIELECTRIC FILMS WITH LOW DIELECTRIC CONSTANTS VERSUM MATERIALS US, LLC 2002-10-03 US disclosed
EP-1225194-A2 Method of forming a dielectric interlayer film with organosilicon precursors AIR PRODUCTS AND CHEMICALS, INC. (US) 2002-07-24 EP disclosed
US-6175031-B1 PLATINUM-CATALYZED HYDROSILYLATION BETWEEN SIH-SUBSTITUTED SILICON COMPOUNDS AND UNSATURATED GROUP-FUNCTIONAL ORGANIC OR ORGANOSILICON COMPOUNDS IN PRESENCE OF A (ACYLOXY)-FUNCTIONAL HYDROGENSILANE COMPOUND OR ACID AND HYDRO(ALKOXY)SILANE DOW CORNING ASIA, LTD. (JP) 2001-01-16 US disclosed