⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL10884831 | 0.98 | — | — | |
| SCHEMBL30112898 | 0.91 | — | — | |
| SCHEMBL8776871 | 0.91 | TSHR (0.36) | — | |
| SCHEMBL17109053 | 0.91 | TSHR (0.36) | — | |
| SCHEMBL8776861 | 0.91 | TSHR (0.36) | — | |
| SCHEMBL8776776 | 0.91 | TSHR (0.36) | — | |
| SCHEMBL38656336 | 0.91 | TSHR (0.36) | — | |
| SCHEMBL11911710 | 0.87 | — | — | |
| SCHEMBL13057768 | 0.85 | — | — | |
| SCHEMBL1984972 | 0.84 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 122 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025106343-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2025-05-22 | — | — | WO | claimed |
| US-20250157825-A1 | ETCHING METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2025-05-15 | — | — | US | claimed |
| US-20240258111-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2024-08-01 | — | — | US | claimed |
| US-11447642-B2 | Methods of using surface treatment compositions | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2022-09-20 | — | — | US | claimed |
| CN-110709731-B | Silicone hydrogel contact lenses | 爱尔康公司 | 2022-05-24 | — | — | CN | claimed |
| US-11174394-B2 | Surface treatment compositions and articles containing same | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2021-11-16 | — | — | US | claimed |
| CN-110621483-B | Silicone hydrogel contact lenses | 爱尔康公司 | 2021-10-29 | — | — | CN | claimed |
| CN-110740855-B | Method for producing silicone hydrogel contact lenses | 爱尔康公司 | 2021-10-22 | — | — | CN | claimed |
| EP-3634732-B1 | METHOD FOR PRODUCING SILICONE HYDROGEL CONTACT LENSES | ALCON RES LTD (US) | 2021-07-21 | — | — | EP | claimed |
| US-20210122925-A1 | METHODS OF USING SURFACE TREATMENT COMPOSITIONS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2021-04-29 | — | — | US | claimed |
| CN-112513192-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2021-03-16 | — | — | CN | claimed |
| CN-111565859-A | Surface treatment composition and method | 富士胶片电子材料美国有限公司 | 2020-08-21 | — | — | CN | claimed |
| US-20200035494-A1 | Surface Treatment Compositions and Methods | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2020-01-30 | — | — | US | claimed |
| CN-110709731-A | Silicone hydrogel contact lenses | 爱尔康公司 | 2020-01-17 | — | — | CN | claimed |
| CN-110621483-A | Silicone hydrogel contact lenses | 爱尔康公司 | 2019-12-27 | — | — | CN | claimed |
| US-20190211210-A1 | SURFACE TREATMENT COMPOSITIONS AND METHODS | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. | 2019-07-11 | — | — | US | claimed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| US-4963470-A | PHOTOINITIATORS | CIBA-GEIGY CORPORATION (US) | 1990-10-16 | — | — | US | disclosed |
| EP-0256981-A2 | Titanocenes and their use | CIBA-GEIGY AG (CH) | 1988-02-24 | — | — | EP | disclosed |