Ammonia Solution, Strong

Ammonia Solution, Strong

SCHEMBL4774266

CC(C)C1CC[C@H]2C(CCC3[C@](C)(C(=O)O)CCC[C@@]32C)C1.N

nearest known ligand 0.43

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 4/20 0.43
F10 P00742 3/20 0.40
RPA1 P27694 2/20 0.40
CYP2C9 P11712 2/20 0.39
MMP2 P08253 1/20 0.39
PTPN2 P17706 1/20 0.39
CDC25B P30305 1/20 0.39
HSD17B10 Q99714 3/20 0.39
ALOX15 P16050 2/20 0.39
LMNA P02545 1/20 0.39
PDK1 Q15118 1/20 0.39
PDK2 Q15119 1/20 0.39
PDK3 Q15120 1/20 0.39
PDK4 Q16654 1/20 0.39
SLCO1B3 Q9NPD5 1/20 0.39
SLCO1B1 Q9Y6L6 1/20 0.39
GABRA1 P14867 1/20 0.39
GABRB2 P47870 1/20 0.39
HSD11B1 P28845 1/20 0.39
CYP3A4 P08684 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12547269 0.99 PTPN1 (0.43) PTPN1F10RPA1CYP2C9MMP2
SCHEMBL31438077 0.99 PTPN1 (0.43) PTPN1F10RPA1CYP2C9MMP2
SCHEMBL20061642 0.99 PTPN1 (0.43) PTPN1F10RPA1CYP2C9MMP2
SCHEMBL26654312 0.99 PTPN1 (0.43) PTPN1F10RPA1CYP2C9MMP2
SCHEMBL27389498 0.99 PTPN1 (0.43) PTPN1F10RPA1CYP2C9MMP2
SCHEMBL9471834 0.99 PTPN1 (0.43) PTPN1F10RPA1CYP2C9MMP2
SCHEMBL678124 0.99 PTPN1 (0.43) PTPN1F10RPA1CYP2C9MMP2
SCHEMBL336573 0.99 PTPN1 (0.43) PTPN1F10RPA1CYP2C9MMP2
Trolamine SCHEMBL9183802 0.89 PTPN1 (0.41) PTPN1F10RPA1CYP2C9MMP2
SCHEMBL11486203 0.89 PTPN1 (0.36) PTPN1F10RPA1CYP2C9MMP2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1965417-B1 POLISHING COMPOSITION AND POLISHING METHOD FOR FORMING COPPER WIRING FOR SEMICONDUCTOR INTEGRATED CIRCUIT ASAHI GLASS CO LTD (JP) 2013-03-06 EP disclosed
US-20080261400-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR FORMING COPPER WIRING FOR SEMICONDUCTOR INTEGRATED CIRCUIT ASAHI GLASS COMPANY, LIMITED (JP) 2008-10-23 US disclosed
EP-1965417-A1 POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR FORMING COPPER WIRING FOR SEMICONDUCTOR INTEGRATED CIRCUIT Asahi Glass Company, Limited (JP) 2008-09-03 EP disclosed