Methacrylic Acid

Methacrylic Acid

SCHEMBL478108

C=C(C)C(=O)O.C=C(C)C(=O)O.OCCOCCOCCOCCOCCOCCOCCOCCOCCOCCO

nearest known ligand 0.52

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Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.52
KMT2A Q03164 3/20 0.52
TSHR P16473 9/20 0.48
MAPK1 P28482 1/20 0.48
THRB P10828 2/20 0.42
HTT P42858 1/20 0.41
MAPT P10636 1/20 0.41
ALDH1A1 P00352 5/20 0.40
TP53 P04637 2/20 0.33
HIF1A Q16665 2/20 0.33
HSD17B10 Q99714 2/20 0.33
TGFBR1 P36897 1/20 0.32
BLM P54132 1/20 0.32
PMP22 Q01453 1/20 0.32
TDP1 Q9NUW8 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL8604056 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Triethylene Glycol SCHEMBL976431 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Methacrylic Acid SCHEMBL9485971 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Hexaethylene Glycol SCHEMBL2347830 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Triethylene Glycol SCHEMBL8661497 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Methacrylic Acid SCHEMBL10529387 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Tetraethylene Glycol SCHEMBL9314003 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Pentaethylene Glycol SCHEMBL672104 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Tetraethylene Glycol SCHEMBL33688 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB
Methacrylic Acid SCHEMBL478199 1.00 MEN1 (0.52) MEN1KMT2ATSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 108 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119798574-A Gel electrolyte precursor, gel composite electrolyte, lithium ion battery and electric equipment 比亚迪股份有限公司 2025-04-11 CN claimed
CN-117423898-A Solid polymer electrolyte with local high-concentration structure, lithium battery and method 南开大学 2024-01-19 CN claimed
CN-112912971-B conductive paste 藤仓化成株式会社 2023-09-26 CN claimed
CN-116179061-A Fluorine-containing single-component polyurea coating and preparation method thereof 浙江锦丰新材料科技有限公司 2023-05-30 CN claimed
CN-112103506-B Quasi-solid battery anode slurry and preparation method and application thereof 蜂巢能源科技有限公司 2022-03-22 CN claimed
CN-113224370-A Gel electrolyte, preparation method and application thereof 南开大学 2021-08-06 CN claimed
CN-112103506-A Quasi-solid battery anode slurry and preparation method and application thereof 蜂巢能源科技有限公司 2020-12-18 CN claimed
CN-119798574-A Gel electrolyte precursor, gel composite electrolyte, lithium ion battery and electric equipment 比亚迪股份有限公司 2025-04-11 CN disclosed
CN-117423898-A Solid polymer electrolyte with local high-concentration structure, lithium battery and method 南开大学 2024-01-19 CN disclosed
US-20230375930-A1 PHOTOSENSITIVE RESIN MULTILAYER BODY ASAHI KASEI KABUSHIKI KAISHA (JP) 2023-11-23 US disclosed
CN-112912971-B conductive paste 藤仓化成株式会社 2023-09-26 CN disclosed
CN-107437600-B Framework and gel matrix integrated lithium ion battery active diaphragm and preparation method thereof 许昌学院 2023-09-19 CN disclosed
CN-116179061-A Fluorine-containing single-component polyurea coating and preparation method thereof 浙江锦丰新材料科技有限公司 2023-05-30 CN disclosed
US-5326346-A Light-cured urethane dimethacrylate ocular prosthesis BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) 1994-07-05 US disclosed
EP-0575143-A2 Resinous particles, method for production thereof, and uses therefor NIPPON SHOKUBAI CO., LTD. (JP) 1993-12-22 EP disclosed
EP-0321618-B1 PHOTOSENSITIVE HARDENABLE COMPOSITIONS DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1993-02-17 EP disclosed
US-5087392-A Controlled cast molding; interrupting polymerization of first mixture of vinyl monomers by reacting with second; heating; efficient SOLA USA, INC. (US) 1992-02-11 US disclosed
EP-0345994-A2 Contact lenses and materials and methods of making same PILKINGTON BARNES HIND, INC. (US) 1989-12-13 EP disclosed
US-4885229-A CONTAINING ACRYLATED ESTERS 501 DAICEL CHEMICAL INDUSTRIES LTD. (JP) 1989-12-05 US disclosed
EP-0321618-A1 Photosensitive hardenable compositions DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 1989-06-28 EP disclosed