Fluoride Ion

Fluoride Ion

SCHEMBL4795663

[F-].[F-].[F-].[F-].[Li+].[Nd].[Y+3]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

GSK3AGSK3BIMPA1

The experimentally established mechanism targets of Fluoride Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL153219 0.87
Fluoride Ion SCHEMBL28839524 0.87
Fluoride Ion SCHEMBL30471510 0.87
Fluoride Ion SCHEMBL814213 0.75
Fluoride Ion SCHEMBL27803889 0.75
Fluoride Ion SCHEMBL3218085 0.75
Fluoride Ion SCHEMBL27902269 0.75
Fluoride Ion SCHEMBL28492847 0.75
Fluoride Ion SCHEMBL9695954 0.75
Fluoride Ion SCHEMBL27700189 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060234519-A1 Contact doping and annealing systems and processes for nanowire thin films NANOSYS, INC. (US) 2006-10-19 US claimed
US-10722983-B2 Method for manufacturing semiconductor device MITSUBISHI ELECTRIC CORPORATION (JP) 2020-07-28 US disclosed
US-20190151999-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE MITSUBISHI ELECTRIC CORPORATION (JP) 2019-05-23 US disclosed
US-7863552-B2 Digital images and related methodologies PALANTYR RESEARCH LLC (US) 2011-01-04 US disclosed
US-7433118-B2 Bridged polysesquioxane host matrices containing lanthanides chelated by organic guest ligands, and methods of making such matrices LUCENT TECHNOLOGIES INC. (US) 2008-10-07 US disclosed
US-7248716-B2 Imaging system, methodology, and applications employing reciprocal space optical design PALANTYR RESEARCH, LLC (US) 2007-07-24 US disclosed
US-7203211-B2 Device and method for the optically exciting laser-active crystals with polarization-dependent absorption LUMERA LASER GMBH (DE) 2007-04-10 US disclosed
US-20060258035-A1 Method of repairing disconnection, method of manufacturing active matrix substrate by using thereof, and display device NEC LCD TECHNOLOGIES, LTD. (JP) 2006-11-16 US disclosed
US-7109464-B2 Semiconductor imaging system and related methodology PALANTYR RESEARCH, LLC (US) 2006-09-19 US disclosed
US-20050069009-A1 Device and method for the optically exciting laser-active crystals with polarization-dependent absorption LUMERA LASER GMBH (DE) 2005-03-31 US disclosed
US-6295986-B1 FOCUSING LASER ONTO FLEXIBLE SURFACE TO CREATE PORES IN MEMBRANE; EXPOSURE TO PLASMA GAS ARADIGM CORPORATION 2001-10-02 US disclosed
WO-2001051111-A1 REACTIVE ION ETCHING METHOD OF FABRICATING NOZZLES FOR AEROSOLIZED DELIVERY OF THERAPEUTIC OR DIAGNOSTIC AGENTS ARADIGM CORPORATION (US) 2001-07-19 WO disclosed
US-6048255-A Pulsed laser surface treatments for magnetic recording media SEAGATE TECHNOLOGY, INC. (US) 2000-04-11 US disclosed
EP-0853528-A1 LASER SURFACE TREATMENTS FOR MAGNETIC RECORDING MEDIA SEAGATE TECHNOLOGY, INC. (US) 1998-07-22 EP disclosed
WO-1997007931-A1 LASER SURFACE TREATMENTS FOR MAGNETIC RECORDING MEDIA SEAGATE TECHNOLOGY, INC. (US) 1997-03-06 WO disclosed
US-5590141-A Method and apparatus for generating and employing a high density of excited ions in a lasant ELECTRO SCIENTIFIC INDUSTRIES, INC. (US) 1996-12-31 US disclosed
EP-0637408-A1 METHOD AND APPARATUS FOR GENERATING AND EMPLOYING A HIGH DENSITY OF EXCITED IONS IN A LASANT ELECTRO SCIENTIFIC INDUSTRIES, INC. (US) 1995-02-08 EP disclosed
US-5323414-A Laser system and method employing a nonimaging concentrator ELECTRO SCIENTIFIC INDUSTRIES, INC. (US) 1994-06-21 US disclosed
WO-1993022811-A1 METHOD AND APPARATUS FOR GENERATING AND EMPLOYING A HIGH DENSITY OF EXCITED IONS IN A LASANT ELECTRO SCIENTIFIC INDUSTRIES, INC. (US) 1993-11-11 WO disclosed
US-5253260-A Apparatus and method for passive heat pipe cooling of solid state laser heads HUGHES AIRCRAFT COMPANY (US) 1993-10-12 US disclosed