⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL719890 | 0.84 | — | — | |
| SCHEMBL14863 | 0.82 | — | — | |
| Sulfuric Acid SCHEMBL3395417 | 0.78 | — | — | |
| SCHEMBL8583471 | 0.78 | GRIK1 (0.30) | — | |
| SCHEMBL3226340 | 0.77 | KDM4E (0.32) | — | |
| SCHEMBL3226326 | 0.77 | KDM4E (0.32) | — | |
| SCHEMBL28787923 | 0.76 | TDP1 (0.40) | — | |
| SCHEMBL630861 | 0.74 | GRIK1 (0.41) | — | |
| SCHEMBL3232685 | 0.74 | GRIK1 (0.41) | — | |
| SCHEMBL29263750 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1201368-B1 | Polishing pad comprising a water-insoluble substance and method for producing thereof | JSR CORP (JP) | 2008-01-16 | — | — | EP | disclosed |
| US-6645264-B2 | Crosslinkable elastomer with no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance with >1 carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups | JSR CORPORATION (JP) | 2003-11-11 | — | — | US | disclosed |
| US-20020078632-A1 | Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof | JSR CORPORATION (JP) | 2002-06-27 | — | — | US | disclosed |
| EP-1201368-A2 | Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof | JSR Corporation (JP) | 2002-05-02 | — | — | EP | disclosed |