SCHEMBL4821605

SCHEMBL4821605

C=CPC=C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5349550 0.62
SCHEMBL4601681 0.59
SCHEMBL5813754 0.59
SCHEMBL22748765 0.59
SCHEMBL12690701 0.59
SCHEMBL5380899 0.59
SCHEMBL4601936 0.59
SCHEMBL6668804 0.59
SCHEMBL3369157 0.58
SCHEMBL821677 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 75 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3794061-B1 PHOSPHORUS CONTAINING OLIGOMERS AND POLYMERS EMPA EIDGENOESSISCHE MAT & FORSCHUNGSANSTALT (CH) 2023-07-05 EP claimed
EP-3765471-A1 NOVEL VINYL PHOSPHINES AND PHOTO-INITIATORS OBTAINABLE THEREFROM Grützmacher, Hansjörg (CH) 2021-01-20 EP claimed
CN-112154149-A Novel vinylphosphines and photoinitiators obtainable therefrom 汉斯约尔格·格吕茨马赫 2020-12-29 CN claimed
WO-2019175319-A1 NOVEL VINYL PHOSPHINES AND PHOTO-INITIATORS OBTAINABLE THEREFROM ETH ZURICH (CH) 2019-09-19 WO claimed
EP-3539924-A1 NOVEL VINYL PHOSPHINES AND PHOTO-INITIATORS OBTAINABLE THEREFROM ETH Zurich (CH) 2019-09-18 EP claimed
EP-0582668-B1 CHIRAL TRIDENTATE BIS(PHOSPHOLANE) LIGANDS DU PONT (US) 1997-11-19 EP claimed
US-5202493-A CHIRAL TRIDENTATE BIS(PHOSPHOLANE) LIGANDS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1993-04-13 US claimed
CN-112154149-B New vinylphosphines and photoinitiators obtainable therefrom 汉斯约尔格·格吕茨马赫 2025-02-21 CN disclosed
CN-118393811-B Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-09-03 CN disclosed
CN-118393812-B Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-08-30 CN disclosed
CN-118244581-B Composition and preparation method thereof, patterned film, patterned substrate, semiconductor device and preparation method thereof 珠海基石科技有限公司 2024-08-13 CN disclosed
CN-118393812-A Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-07-26 CN disclosed
CN-118393811-A Patterning composition, patterning film, patterning substrate, semiconductor device, and method of manufacturing the same 珠海基石科技有限公司 2024-07-26 CN disclosed
WO-1992019630-A1 CHIRAL TRIDENTATE BIS(PHOSPHOLANE) LIGANDS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-11-12 WO disclosed
EP-0471685-A1 PROCESS FOR COATING ELECTRICALLY CONDUCTIVE SUBSTRATES. BASF LACKE & FARBEN (DE) 1992-02-26 EP disclosed
WO-1990013686-A1 PROCESS FOR COATING ELECTRICALLY CONDUCTIVE SUBSTRATES BASF LACKE + FARBEN AKTIENGESELLSCHAFT (DE) 1990-11-15 WO disclosed
CN-1009367-B POLYMERIZATION PROCESS GOODYEAR TIRE & RUBBER (US) 1990-08-29 CN disclosed
CN-88101272-A POLYMERIZATION PROCESS 1988-11-09 CN disclosed
EP-0263054-A2 Rubber composition THE GOODYEAR TIRE & RUBBER COMPANY (US) 1988-04-06 EP disclosed
US-4507247-A PREPARATION OF CATALYSTS FOR THE OLIGOMERIZATION OF ETHYLENE GULF RESEARCH & DEVELOPMENT COMPANY (US) 1985-03-26 US disclosed