Known targets — ChEMBL curated mechanism
ADRA2AADRA2BADRA2CADRB2AGTR1AVPR1AAVPR1BAVPR2BDKRB2CALCRCHRNA3CHRNB4ESR1ESR2GHSRGNRHRGSC1HSPA8MALT1MC1RMC4RNOS1NOS2NOS3OPRK1OXTRRAMP1RAMP2RAMP3SCN5ASSTR1SSTR2SSTR3SSTR4SSTR5dacAdacBdacCfolPftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of Acetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acetic Acid SCHEMBL27145924 | 1.00 | — | — | |
| Acetic Acid SCHEMBL28097741 | 1.00 | — | — | |
| Acetic Acid SCHEMBL3012542 | 1.00 | — | — | |
| Acetic Acid SCHEMBL3012541 | 1.00 | FFAR3 (0.88) | — | |
| Acetic Acid SCHEMBL2224826 | 1.00 | — | — | |
| Acetic Acid SCHEMBL10520351 | 0.94 | — | — | |
| Acetic Acid SCHEMBL6048835 | 0.94 | — | — | |
| Acetic Acid SCHEMBL6291257 | 0.94 | — | — | |
| Acetic Acid SCHEMBL3873115 | 0.94 | — | — | |
| Acetic Acid SCHEMBL912396 | 0.94 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100514651-C | Semiconductor device and method of making semiconductor devices | SEIKO EPSON CORP (JP) | 2009-07-15 | — | — | CN | disclosed |
| CN-101471247-A | Method for manufacturing semiconductor device and semiconductor device | SEIKO EPSON CORP (JP) | 2009-07-01 | — | — | CN | disclosed |
| US-7465641-B2 | Method for manufacturing a semiconductor device | SEIKO EPSON CORPORATION (JP) | 2008-12-16 | — | — | US | disclosed |
| CN-101013708-A | Semiconductor device and manufacturing method thereof | SEIKO EPSON CORP (JP) | 2007-08-08 | — | — | CN | disclosed |
| CN-1941375-A | Semiconductor device and method of making semiconductor devices | SEIKO EPSON CORP (JP) | 2007-04-04 | — | — | CN | disclosed |
| US-20060223271-A1 | Method for manufacturing a semiconductor device | SEIKO EPSON CORPORATION (JP) | 2006-10-05 | — | — | US | disclosed |