⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4643363 | 0.97 | — | — | |
| SCHEMBL18242671 | 0.97 | — | — | |
| SCHEMBL4826298 | 0.97 | — | — | |
| SCHEMBL18243273 | 0.97 | — | — | |
| SCHEMBL18242881 | 0.97 | — | — | |
| SCHEMBL18241874 | 0.97 | — | — | |
| SCHEMBL4829799 | 0.97 | — | — | |
| SCHEMBL18243510 | 0.97 | — | — | |
| SCHEMBL18242946 | 0.97 | — | — | |
| SCHEMBL4837412 | 0.97 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220069354-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2022-03-03 | — | — | US | disclosed |
| EP-3904337-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | FUJIFILM Wako Pure Chemical Corporation (JP) | 2021-11-03 | — | — | EP | disclosed |
| US-20210280870-A1 | POSITIVE ELECTRODE ACTIVE MATERIAL FOR MAGNESIUM BATTERIES | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2021-09-09 | — | — | US | disclosed |
| EP-3832763-A1 | POSITIVE ELECTRODE ACTIVE MATERIAL FOR MAGNESIUM BATTERIES | FUJIFILM Wako Pure Chemical Corporation (JP) | 2021-06-09 | — | — | EP | disclosed |
| WO-2020138377-A1 | SULFUR-BASED ELECTROLYTE SOLUTION FOR MAGNESIUM CELL | 富士フイルム和光純薬株式会社 | 2020-07-02 | — | — | WO | disclosed |
| US-10451967-B2 | Acid- and radical-generating agent and method for generating acid and radical | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| US-10367231-B2 | Magnesium-containing electrolytic solution | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-07-30 | — | — | US | disclosed |
| EP-3226340-B1 | MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-11-07 | — | — | EP | disclosed |
| US-20170331154-A1 | MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-11-16 | — | — | US | disclosed |
| EP-3226340-A1 | MAGNESIUM-CONTAINING ELECTROLYTIC SOLUTION | Wako Pure Chemical Industries, Ltd. (JP) | 2017-10-04 | — | — | EP | disclosed |
| US-20160342084-A1 | ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-7374857-B2 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2008-05-20 | — | — | US | disclosed |
| US-20050038261-A1 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | WAKO PURE CHEMICAL INDUSTRIES LTD. (JP) | 2005-02-17 | — | — | US | disclosed |
| EP-1449833-A1 | BISIMIDE COMPOUND, ACID GENERATOR AND RESIST COMPOSITION EACH CONTAINING THE SAME, AND METHOD OF FORMING PATTERN FROM THE COMPOSITION | Wako Pure Chemical Industries, Ltd. (JP) | 2004-08-25 | — | — | EP | disclosed |