⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17799153 | 0.92 | — | — | |
| SCHEMBL31164819 | 0.89 | TRIM24 (0.36) | — | |
| SCHEMBL14163832 | 0.89 | TRIM24 (0.36) | — | |
| SCHEMBL23630990 | 0.89 | — | — | |
| SCHEMBL9450094 | 0.83 | — | — | |
| SCHEMBL482887 | 0.81 | — | — | |
| SCHEMBL9148354 | 0.78 | — | — | |
| SCHEMBL1052068 | 0.69 | — | — | |
| SCHEMBL19203703 | 0.67 | — | — | |
| SCHEMBL17690420 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2862024-B1 | POSITIVE PHOTOSENSITIVE MATERIAL | MERCK PATENT GMBH (DE) | 2021-12-01 | — | — | EP | claimed |
| EP-3446180-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-04-01 | — | — | EP | claimed |
| EP-2929397-B1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2020-03-18 | — | — | EP | claimed |
| EP-2872511-B1 | IMIDAZOPYRAZINE DERIVATIVES AS MODULATORS OF TNF ACTIVITY | UCB BIOPHARMA SPRL (BE) | 2019-01-16 | — | — | EP | claimed |
| EP-2861638-B1 | NEGATIVE-WORKING THICK FILM PHOTORESIST | AZ ELECTRONIC MAT LUXEMBOURG SARL (LU) | 2018-11-14 | — | — | EP | claimed |
| EP-2872508-B1 | IMIDAZOPYRIDINE DERIVATIVES AS MODULATORS OF TNF ACTIVITY | UCB BIOPHARMA SPRL (BE) | 2018-08-29 | — | — | EP | claimed |
| EP-2858983-B1 | TNF-ALPHA MODULATING BENZIMIDAZOLES | UCB BIOPHARMA SPRL (BE) | 2018-04-18 | — | — | EP | claimed |
| EP-2307013-B1 | PAIN-RELIEVING COMPOSITIONS OF FUROXAN NO DONORS AND USES THEREOF | UNIV QUEENSLAND (AU) | 2016-02-24 | — | — | EP | claimed |
| EP-2230238-B1 | INDOLE AND INDAZOLE DERIVATIVES HAVING A CELL-, TISSUE- AND ORGAN-PRESERVING EFFECT | LG LIFE SCIENCES LTD (KR) | 2013-12-11 | — | — | EP | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1563343-B1 | ANTIREFLECTIVE COMPOSITIONS FOR PHOTORESISTS | AZ ELECTRONIC MATERIALS USA (US) | 2012-01-11 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| EP-1597287-B1 | VINYL ADDITION POLYCYCLIC OLEFIN POLYMERS PREPARED WITH NON-OLEFINIC CHAIN TRANSFER AGENTS AND USES THEREOF | PROMERUS LLC (US) | 2010-05-05 | — | — | EP | claimed |
| EP-1606282-B1 | PHENYL- AND PYRIDYLPIPEREIDINYE-DERIVATIVES AS MODULATORS OF GLUCOSE METABOLISM | ARENA PHARM INC (US) | 2008-11-12 | — | — | EP | claimed |
| EP-1465877-B1 | POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING | AZ ELECTRONIC MATERIALS USA (US) | 2008-09-24 | — | — | EP | claimed |
| EP-1219625-B1 | Novel substituted 2-(6-benzyl-5-oxo-3-phenyl-(S3,7S,7AR)- perhydroimidazol (1,5-C) (1,3) thiazol-7YL) compounds | COUNCIL SCIENT IND RES (IN) | 2006-05-17 | — | — | EP | claimed |
| EP-1179749-B1 | Resist composition and method for manufacturing semiconductor device using the resist composition | SEMICONDUCTOR LEADING EDGE TEC (JP) | 2003-10-08 | — | — | EP | claimed |
| EP-0880074-B1 | An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC (US) | 1999-10-27 | — | — | EP | claimed |
| EP-0645679-B1 | Resist material and pattern forming process | FUJITSU LTD (JP) | 1997-10-01 | — | — | EP | claimed |