SCHEMBL483299

SCHEMBL483299

C[CH]CCCP(=O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14957292 0.92 TYMS (0.52)
SCHEMBL28339508 0.90 LPAR3 (0.56)
SCHEMBL21385310 0.83
SCHEMBL4812082 0.80 TYMS (0.50)
SCHEMBL6257489 0.76
SCHEMBL796167 0.74
SCHEMBL4821027 0.74
SCHEMBL20235 0.73 TYMS (0.85)
SCHEMBL182326 0.73 TYMS (1.00)
Butane SCHEMBL15477382 0.72 LPAR3 (0.52)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 544 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1657286-B1 Radiation curable ink jet ink, comprising a polymerisation initiation sensitising dye FUJIFILM CORP (JP) 2018-07-04 EP disclosed
EP-1859954-B2 Planographic printing plate precursor and stack thereof FUJIFILM CORP (JP) 2017-11-08 EP disclosed
EP-2042921-B1 Pigment dispersion composition, photocurable composition and color filter FUJIFILM CORP (JP) 2017-10-25 EP disclosed
EP-2006738-B1 Lithographic printing plate precursor FUJIFILM CORP (JP) 2017-09-06 EP disclosed
US-9557643-B2 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same and electronic device FUJIFILM CORPORATION (JP) 2017-01-31 US disclosed
EP-2259141-B1 PROCESS FOR PRODUCING LITHOGRAPHIC PRINTING PLATE FUJIFILM CORP (JP) 2016-11-23 EP disclosed
EP-1939687-B1 Polymerizable composition and lithographic printing plate precursor FUJIFILM CORP (JP) 2016-09-14 EP disclosed
US-9442372-B2 Pigment dispersion composition, photocurable composition and color filter FUJIFILM CORPORATION (JP) 2016-09-13 US disclosed
US-9429840-B2 Pattern forming method, composition used therein, method for manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2016-08-30 US disclosed
EP-1564591-B1 Polymerizable composition FUJIFILM CORP (JP) 2016-08-03 EP disclosed
EP-0922570-A2 Planographic printing plate precursor and a method for producing a planographic plate Fuji Photo Film Co., Ltd. (JP) 1999-06-16 EP disclosed
US-5837748-A THIAZOLYLIDENE DERIVATIVE PHOTOINITIATOR; VISIBLE LIGHT PHOTOSENSITIVITY; PRINTING PLATES FUJI PHOTO FILM CO., LTD. (JP) 1998-11-17 US disclosed
EP-0860741-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1998-08-26 EP disclosed
EP-0710887-B1 Photopolymerizable composition FUJI PHOTO FILM CO LTD (JP) 1998-07-29 EP disclosed
US-5721288-A FOR UNSATURATED COMPOUNDS FUJI PHOTO FILM CO., LTD. (JP) 1998-02-24 US disclosed
EP-0822447-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1998-02-04 EP disclosed
US-5609992-A UNSATURATED COMPOUND AND A THIAZOLONE PHOTOSENSITIZER FUJI PHOTO FILM CO., LTD. (JP) 1997-03-11 US disclosed
EP-0726497-A2 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1996-08-14 EP disclosed
EP-0726498-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1996-08-14 EP disclosed
EP-0710887-A1 Photopolymerizable composition FUJI PHOTO FILM CO., LTD. (JP) 1996-05-08 EP disclosed