SCHEMBL4846969

SCHEMBL4846969

C[Si](C)(Cl)CCCCBr

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4538327 0.97
SCHEMBL4532739 0.97
SCHEMBL4527337 0.97
SCHEMBL4535519 0.97
SCHEMBL4533923 0.97
SCHEMBL4530516 0.97
SCHEMBL4538923 0.97
SCHEMBL4516349 0.97
SCHEMBL4539374 0.97
SCHEMBL4530532 0.97

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112898573-B Organic silicon corrosion inhibitor and preparation method thereof 濮阳市万良石油科技发展有限公司 2022-03-01 CN claimed
CN-109174048-B Silica gel chromatographic packing and preparation method thereof 月旭科技(上海)股份有限公司 2021-12-28 CN claimed
CN-112898573-A Organic silicon corrosion inhibitor and preparation method thereof 张玉花 2021-06-04 CN claimed
CN-109174048-A Silica gel chromatographic column filling material and preparation method thereof 月旭科技(上海)股份有限公司 2019-01-11 CN claimed
JP-1121292-A None JP disclosed
EP-4083046-B1 METHOD FOR PREPARING HALOSILANE COMPOUNDS SHINETSU CHEMICAL CO (JP) 2025-03-26 EP disclosed
US-11780938-B2 Copolymers containing pendant ionomeric carbosilane groups 3M INNOVATIVE PROPERTIES COMPANY (US) 2023-10-10 US disclosed
US-11731992-B2 Method for preparing halosilane compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-22 US disclosed
US-20230203212-A1 COPOLYMERS CONTAINING PENDANT IONOMERIC CARBOSILANE GROUPS US DEPARTMENT OF ENERGY 2023-06-29 US disclosed
EP-4077415-B1 COPOLYMERS CONTAINING PENDANT IONOMERIC CARBOSILANE GROUPS 3M INNOVATIVE PROPERTIES COMPANY (US) 2023-06-14 EP disclosed
CN-114829412-B Copolymers containing pendant ionomeric carbosilane groups 3M创新有限公司 2023-05-16 CN disclosed
US-20220356195-A1 METHOD FOR PREPARING HALOSILANE COMPOUNDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-11-10 US disclosed
US-7463400-B1 Electrochromic display device FUJI XEROX CO., LTD. (JP) 2008-12-09 US disclosed
US-6284365-B1 FOR CONTROLLING PHYSICAL PROPERTIES OF SURFACE AND INTERFACE OF SOLID ARTICLE SUCH AS WETTABILITY, ADHESIVE PROPERTY, SURFACE ENERGY, DISPERSABILITY, CHEMICAL RESISTANCE FUJI XEROX CO., LTD. (JP) 2001-09-04 US disclosed
EP-0484857-B1 Polyorganosiloxane having a quaternary salt at its one terminal and percutaneous absorption-promoting agent SAGAMI CHEM RES (JP) 1997-05-07 EP disclosed
US-5200488-A POLYORGANOSILOXANE HAVING A QUATERNARY SALT AT ITS ONE TERMINAL AND PERCUTANEOUS ABSORPTION-PROMOTING AGENT SAGAMI CHEMICAL RESEARCH CENTER (JP) 1993-04-06 US disclosed
EP-0484857-A2 Polyorganosiloxane having a quaternary salt at its one terminal and percutaneous absorption-promoting agent SAGAMI CHEMICAL RESEARCH CENTER (JP) 1992-05-13 EP disclosed
US-4833262-A Oxygen permeable polymeric materials BAUSCH & LOMB INCORPORATED (US) 1989-05-23 US disclosed
JP-H01121292-A OXYGEN PERMEABLE POLYMERIC MATERIAL BAUSCH & LOMB INC 1989-05-12 JP disclosed
EP-0303480-A2 Oxygen permeable polymeric materials BAUSCH &amp; LOMB INCORPORATED (US) 1989-02-15 EP disclosed