⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL60281 | 1.00 | — | — | |
| SCHEMBL31236108 | 0.97 | — | — | |
| SCHEMBL1022581 | 0.97 | — | — | |
| SCHEMBL28489647 | 0.97 | — | — | |
| SCHEMBL8016190 | 0.97 | — | — | |
| SCHEMBL1346133 | 0.97 | — | — | |
| SCHEMBL727998 | 0.97 | — | — | |
| SCHEMBL4110914 | 0.97 | — | — | |
| SCHEMBL8672441 | 0.97 | — | — | |
| SCHEMBL1021487 | 0.97 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240116963-A1 | DENDRIMERS HAVING THIOPHOSPHORAMIDATE PATTERNS AND DERIVATIVES | INSERM (INSTITUT NATIONAL DE LA SANTE ET DE LA RECHERCHE MEDICALE) (FR) | 2024-04-11 | — | — | US | disclosed |
| US-20230235190-A1 | FLUORESCENT COMPOSITION COMPRISING AT LEAST ONE BENZAZOLE COMPOUND FOR THE SECUREMENT OF PRODUCTS | Crime Science Technology (FR) | 2023-07-27 | — | — | US | disclosed |
| EP-4164891-A1 | FLUORESCENT COMPOSITION COMPRISING AT LEAST ONE BENZAZOLE COMPOUND FOR THE SECUREMENT OF PRODUCTS | Crime Science Technology (FR) | 2023-04-19 | — | — | EP | disclosed |
| US-20230013304-A1 | N2-ARYLMETHYL-4-HALOALKYL-PYRIDAZIN-3-ONE CFTR MODULATORS FOR THE TREATMENT OF CYSTIC FIBROSIS | ECOLE NORMALE SUPERIEURE DE LYON (FR) | 2023-01-19 | — | — | US | disclosed |
| EP-4081530-A1 | DENDRIMERS HAVING THIOPHOSPHORAMIDATE PATTERNS AND DERIVATIVES | Centre National de la Recherche Scientifique (CNRS) (FR) | 2022-11-02 | — | — | EP | disclosed |
| CN-114945368-A | N2-arylmethyl-4-haloalkyl-pyridazin-3-one compounds and uses thereof | 香槟-阿尔登兰斯大学 | 2022-08-26 | — | — | CN | disclosed |
| CN-114867731-A | Dendritic macromolecule with sulfur and phosphoric amide crystal structure and derivative thereof | 国家科学研究中心 | 2022-08-05 | — | — | CN | disclosed |
| WO-2021130454-A1 | DENDRIMERS HAVING THIOPHOSPHORAMIDATE PATTERNS AND DERIVATIVES | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE - CNRS - (FR) | 2021-07-01 | — | — | WO | disclosed |
| WO-2021105641-A1 | N2-ARYLMETHYL-4-HALOALKYL-PYRIDAZIN-3-ONE CFTR MODULATORS FOR THE TREATMENT OF CYSTIC FIBROSIS | UNIVERSITE DE REIMS CHAMPAGNE-ARDENNE (FR) | 2021-06-03 | — | — | WO | disclosed |
| US-20170137419-A1 | DERIVATIVES OF 2H-PYRAZOLO[4,3-C]QUINOLIN-3(5H)-ONE AND USE THEREOF | INSERM (INSTITUT NATIONAL DE LA SANTE ET DE LA RECHERCHE MEDICALE) (FR) | 2017-05-18 | — | — | US | disclosed |
| US-9562122-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-07 | — | — | US | disclosed |
| US-20160053032-A1 | COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-7364823-B2 | Amine compound, electrophotographic photoreceptor using the amine compound and image forming apparatus having the same | SHARP KABUSHIKI KAISHA (JP) | 2008-04-29 | — | — | US | disclosed |
| US-20050238973-A1 | Amine compound, electrophotographic photoreceptor using the amine compound and image forming apparatus having the same | SHARP KABUSHIKI KAISHA (JP) | 2005-10-27 | — | — | US | disclosed |
| US-6756179-B2 | A POSITIVE RESIST COMPRISING: A RESIN CAPABLE OF DECOMPOSING BY THE ACTION OF AN ACID TO INCREASE SOLUBILITY IN AN ALKALI DEVELOPER, AND A COMPOUND CAPABLE OF GENERATING AROMATIC SULFONIC ACID SUBSTITUTED WITH A FLUORINE CONTAINING GROUP | FUJI PHOTO FILM CO., LTD. (JP) | 2004-06-29 | — | — | US | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| EP-0658552-B1 | Process for the preparation of alpha-tocopherol derivatives | EISAI CO LTD (JP) | 1999-03-31 | — | — | EP | disclosed |
| US-5532387-A | CYCLIZATION OF TRIMETHYLHYDROQUINONE AND AN ALKENYL ALCOHOL, REUSABLE CATALYST, IIIB FLUOROSULFONATE, NITRATE, SULFATE, OR FLUOROALKYLSULFONATE | EISAI CO., LTD. (JP) | 1996-07-02 | — | — | US | disclosed |
| EP-0658552-A1 | Process for the preparation of alpha-tocopherol derivatives | Eisai Co., Ltd. (JP) | 1995-06-21 | — | — | EP | disclosed |