SCHEMBL4859532

SCHEMBL4859532

CC1CCC1.CP(C)(C)=O

nearest known ligand 0.35

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
CYP2C9 P11712 1/20 0.35
TSHR P16473 1/20 0.35
CYP2C19 P33261 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
CA4 P22748 1/20 0.33
ACHE P22303 2/20 0.32
KMT2A Q03164 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2368 0.80
Water SCHEMBL28967112 0.76
SCHEMBL34468141 0.76 CYP2C9 (0.44) CYP2C9TSHRCYP2C19TDP1CA1
Ammonia Solution, Strong SCHEMBL3799540 0.76
SCHEMBL1269845 0.76 CYP2C9 (0.44) CYP2C9TSHRCYP2C19TDP1CA1
Water SCHEMBL17309998 0.76 CYP2C9 (0.44) CYP2C9TSHRCYP2C19TDP1CA1
Hydrochloric Acid SCHEMBL1937438 0.76
SCHEMBL1269342 0.76 CYP2C9 (0.44) CYP2C9TSHRCYP2C19TDP1CA1
SCHEMBL7075565 0.72 TDP1 (0.41) CYP2C9TSHRCYP2C19TDP1CA1
SCHEMBL6585508 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0780712-A2 Peelable bonded ribbon matrix material; optical fiber bonded ribbon arrays containing same; and process for preparing said optical fiber bonded ribbon arrays BORDEN CHEMICAL, INC. (US) 1997-06-25 EP claimed
WO-2024013845-A1 SHEET FOR INKJET PRINTING リンテック株式会社 2024-01-18 WO disclosed
CN-102446576-A Transparent conductive film with high light penetration and preparation method thereof FAR EASTERN NEW CENTURY CORP 2012-05-09 CN disclosed
US-7320854-B2 Mixture of oxide particles, polymerizable compound,radiation sensitive decomposer and releasing agent JSR CORPORATION (JP) 2008-01-22 US disclosed
EP-1494072-A2 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR Corporation (JP) 2005-01-05 EP disclosed
US-20040265737-A1 Radiation sensitive refractive index changing composition, pattern forming method and optical material JSR CORPORATION (JP) 2004-12-30 US disclosed