Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | FDPS | P14324 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2835413 | 0.97 | SMN1; SMN2 (0.38) | SMN1; SMN2FDPSMEN1KMT2A | |
| SCHEMBL20905549 | 0.82 | SMN1; SMN2 (0.35) | SMN1; SMN2FDPSMEN1KMT2A | |
| SCHEMBL24264704 | 0.80 | SMN1; SMN2 (0.38) | SMN1; SMN2FDPSMEN1KMT2A | |
| SCHEMBL20130470 | 0.79 | DPP7 (0.33) | SMN1; SMN2 | |
| SCHEMBL11156139 | 0.78 | MC4R (0.39) | — | |
| SCHEMBL18526726 | 0.78 | SMN1; SMN2 (0.33) | SMN1; SMN2FDPS | |
| SCHEMBL24810232 | 0.77 | — | — | |
| SCHEMBL17377285 | 0.77 | SMN1; SMN2 (0.35) | SMN1; SMN2FDPSMEN1KMT2A | |
| SCHEMBL9735269 | 0.76 | SMN1; SMN2 (0.36) | SMN1; SMN2MEN1KMT2A | |
| SCHEMBL4359607 | 0.76 | USP2 (0.39) | SMN1; SMN2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106103396-A | Compound, resin, lower layer film for lithography form material, lower layer film for lithography, pattern formation method and compound or the purification process of resin | 三菱瓦斯化学株式会社 | 2016-11-09 | — | — | CN | disclosed |
| US-8912248-B2 | Pigment dispersion and ink composition, curable composition and curable ink composition making use of the same | FUJIFILM CORPORATION (JP) | 2014-12-16 | — | — | US | disclosed |
| US-20140178462-A1 | AMPHOTERIC LIPOSOMES COMPRISING NEUTRAL LIPIDS | MARINA BIOTECH, INC. (US) | 2014-06-26 | — | — | US | disclosed |
| CN-101477307-B | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN ETSU EHEMICAL CO LTD | 2012-12-12 | — | — | CN | disclosed |
| US-8293837-B2 | Pigment dispersion, and ink composition, curable composition and curable ink composition produced with pigment dispersion | FUJIFILM CORPORATION (JP) | 2012-10-23 | — | — | US | disclosed |
| EP-2233536-B1 | Pigment dispersion and ink composition, curable composition and curable ink composition making use of the same | FUJIFILM CORP (JP) | 2012-05-16 | — | — | EP | disclosed |
| EP-2233537-B1 | Pigment dispersion, and ink composition, curable composition and curable ink composition produced with pigment dispersion | FUJIFILM CORP (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-20100330154-A1 | AMPHOTERIC LIPOSOMES COMPRISING NEUTRAL LIPIDS | MARINA BIOTECH, INC. | 2010-12-30 | — | — | US | disclosed |
| EP-2233537-A1 | Pigment dispersion, and ink composition, curable composition and curable ink composition produced with pigment dispersion | Fujifilm Corporation (JP) | 2010-09-29 | — | — | EP | disclosed |
| EP-2233536-A1 | Pigment dispersion and ink composition, curable composition and curable ink composition making use of the same | Fujifilm Corporation (JP) | 2010-09-29 | — | — | EP | disclosed |
| US-20100240825-A1 | PIGMENT DISPERSION, AND INK COMPOSITION, CURABLE COMPOSITION AND CURABLE INK COMPOSITION PRODUCED WITH PIGMENT DISPERSION | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| US-20100240830-A1 | PIGMENT DISPERSION AND INK COMPOSITION, CURABLE COMPOSITION AND CURABLE INK COMPOSITION MAKING USE OF THE SAME | FUJIFILM CORPORATION (JP) | 2010-09-23 | — | — | US | disclosed |
| EP-2211840-A2 | AMPHOTERIC LIPOSOMES COMPRISING NEUTRAL LIPIDS | novosom AG (DE) | 2010-08-04 | — | — | EP | disclosed |
| CN-101477307-A | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2009-07-08 | — | — | CN | disclosed |
| WO-2009047006-A2 | AMPHOTERIC LIPOSOMES COMPRISING NEUTRAL LIPIDS | NOVOSOM AG (DE) | 2009-04-16 | — | — | WO | disclosed |
| US-6548514-B1 | Inhibitors of p38 kinase/cytokine suppressive binding protein (CSBP)/reactivating kinase (RK); 1-((pyridyl)aminocarbonyl)-3-((hetero)arylaminocarbonyl)benzene derivatives; treating cytokine related diseases and disorders | ASTRAZENECA AB (SE) | 2003-04-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100330154-A1 | AMPHOTERIC LIPOSOMES COMPRISING NEUTRAL LIPIDS | LIPA, CETP, SGMS1 | SMN1; SMN2 3859/4885FDPS 3438/4885MEN1 237/4885 |
| US-20140178462-A1 | AMPHOTERIC LIPOSOMES COMPRISING NEUTRAL LIPIDS | LIPA, CETP, SGMS1 | SMN1; SMN2 3859/4885FDPS 3438/4885MEN1 237/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.